Electrical transport and magnetic properties of reactive sputtered polycrystalline Ti1−xCrxN films
The magnetoresistance (MR) and magnetic properties of (2 0 0) preferentially oriented Ti1-xCrxN films have been investigated systematically. All the films are ferromagnetic. The Curie temperature of the films is above 305 K, which is much higher than the previously reported value of 140 K in the Ti1...
Gespeichert in:
Veröffentlicht in: | Journal of physics. D, Applied physics Applied physics, 2010-10, Vol.43 (41), p.415003-415003 |
---|---|
Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 415003 |
---|---|
container_issue | 41 |
container_start_page | 415003 |
container_title | Journal of physics. D, Applied physics |
container_volume | 43 |
creator | Mi, W B Ye, T Y Wang, X C Tan, H Bai, H L |
description | The magnetoresistance (MR) and magnetic properties of (2 0 0) preferentially oriented Ti1-xCrxN films have been investigated systematically. All the films are ferromagnetic. The Curie temperature of the films is above 305 K, which is much higher than the previously reported value of 140 K in the Ti1-xCrxN systems. MR shows a weak saturation trend with the applied magnetic field, and increases significantly with a decrease in temperature below 50 K following the relation log |
doi_str_mv | 10.1088/0022-3727/43/41/415003 |
format | Article |
fullrecord | <record><control><sourceid>proquest_iop_p</sourceid><recordid>TN_cdi_proquest_miscellaneous_855688917</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>855688917</sourcerecordid><originalsourceid>FETCH-LOGICAL-i297t-a0fdabd22ca2190ca763b1ca421b32b3672d9a101d1b3c7986fbe7a2cf2b0ed63</originalsourceid><addsrcrecordid>eNptkM9KAzEQxoMoWP-8guQintZmku1m9yjFfyB6qecwm2Qlku6uSSr2DTz7iD6JKZVeFAaGYX7fMN9HyBmwS2B1PWWM80JILqelmJaQa8aY2CMTEBUUVVmJfTLZQYfkKMZXxtisqmFCzLW3OgWn0dMUsI_jEBLF3tAlvvQ2OU3HMIw2JGcjHToaLOrk3i2N4yolG6yh4-DXOqxjQu9db-nCwffn18c8fDzSzvllPCEHHfpoT3_7MXm-uV7M74qHp9v7-dVD4XgjU4GsM9gazjVyaJhGWYkWNJYcWsFbUUluGgQGJs9aNnXVtVYi1x1vmTWVOCYX27v55beVjUktXdTWe-ztsIqqnmXTdQMyk-e_JMZsvcvOtYtqDG6JYa24EDNZMsgcbDk3jLstMLUJXm0yVZtMVSlUCWobfNYUfzX_s2o0nfgBuVCGqw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>855688917</pqid></control><display><type>article</type><title>Electrical transport and magnetic properties of reactive sputtered polycrystalline Ti1−xCrxN films</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Mi, W B ; Ye, T Y ; Wang, X C ; Tan, H ; Bai, H L</creator><creatorcontrib>Mi, W B ; Ye, T Y ; Wang, X C ; Tan, H ; Bai, H L</creatorcontrib><description>The magnetoresistance (MR) and magnetic properties of (2 0 0) preferentially oriented Ti1-xCrxN films have been investigated systematically. All the films are ferromagnetic. The Curie temperature of the films is above 305 K, which is much higher than the previously reported value of 140 K in the Ti1-xCrxN systems. MR shows a weak saturation trend with the applied magnetic field, and increases significantly with a decrease in temperature below 50 K following the relation log</description><identifier>ISSN: 0022-3727</identifier><identifier>EISSN: 1361-6463</identifier><identifier>DOI: 10.1088/0022-3727/43/41/415003</identifier><identifier>CODEN: JPAPBE</identifier><language>eng</language><publisher>Bristol: IOP Publishing</publisher><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Cross-disciplinary physics: materials science; rheology ; Curie temperature ; Deposition by sputtering ; Exact sciences and technology ; Ferromagnetic materials ; Magnetic fields ; Magnetic properties ; Magnetic properties and materials ; Magnetic properties of monolayers and thin films ; Magnetic properties of surface, thin films and multilayers ; Magnetoresistance ; Magnetoresistivity ; Magnetotransport phenomena, materials for magnetotransport ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Physics ; Saturation ; Studies of specific magnetic materials ; Transport</subject><ispartof>Journal of physics. D, Applied physics, 2010-10, Vol.43 (41), p.415003-415003</ispartof><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.1088/0022-3727/43/41/415003/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,780,784,27923,27924,53829,53909</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=23357401$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Mi, W B</creatorcontrib><creatorcontrib>Ye, T Y</creatorcontrib><creatorcontrib>Wang, X C</creatorcontrib><creatorcontrib>Tan, H</creatorcontrib><creatorcontrib>Bai, H L</creatorcontrib><title>Electrical transport and magnetic properties of reactive sputtered polycrystalline Ti1−xCrxN films</title><title>Journal of physics. D, Applied physics</title><description>The magnetoresistance (MR) and magnetic properties of (2 0 0) preferentially oriented Ti1-xCrxN films have been investigated systematically. All the films are ferromagnetic. The Curie temperature of the films is above 305 K, which is much higher than the previously reported value of 140 K in the Ti1-xCrxN systems. MR shows a weak saturation trend with the applied magnetic field, and increases significantly with a decrease in temperature below 50 K following the relation log</description><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Curie temperature</subject><subject>Deposition by sputtering</subject><subject>Exact sciences and technology</subject><subject>Ferromagnetic materials</subject><subject>Magnetic fields</subject><subject>Magnetic properties</subject><subject>Magnetic properties and materials</subject><subject>Magnetic properties of monolayers and thin films</subject><subject>Magnetic properties of surface, thin films and multilayers</subject><subject>Magnetoresistance</subject><subject>Magnetoresistivity</subject><subject>Magnetotransport phenomena, materials for magnetotransport</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Physics</subject><subject>Saturation</subject><subject>Studies of specific magnetic materials</subject><subject>Transport</subject><issn>0022-3727</issn><issn>1361-6463</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNptkM9KAzEQxoMoWP-8guQintZmku1m9yjFfyB6qecwm2Qlku6uSSr2DTz7iD6JKZVeFAaGYX7fMN9HyBmwS2B1PWWM80JILqelmJaQa8aY2CMTEBUUVVmJfTLZQYfkKMZXxtisqmFCzLW3OgWn0dMUsI_jEBLF3tAlvvQ2OU3HMIw2JGcjHToaLOrk3i2N4yolG6yh4-DXOqxjQu9db-nCwffn18c8fDzSzvllPCEHHfpoT3_7MXm-uV7M74qHp9v7-dVD4XgjU4GsM9gazjVyaJhGWYkWNJYcWsFbUUluGgQGJs9aNnXVtVYi1x1vmTWVOCYX27v55beVjUktXdTWe-ztsIqqnmXTdQMyk-e_JMZsvcvOtYtqDG6JYa24EDNZMsgcbDk3jLstMLUJXm0yVZtMVSlUCWobfNYUfzX_s2o0nfgBuVCGqw</recordid><startdate>20101020</startdate><enddate>20101020</enddate><creator>Mi, W B</creator><creator>Ye, T Y</creator><creator>Wang, X C</creator><creator>Tan, H</creator><creator>Bai, H L</creator><general>IOP Publishing</general><general>Institute of Physics</general><scope>IQODW</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20101020</creationdate><title>Electrical transport and magnetic properties of reactive sputtered polycrystalline Ti1−xCrxN films</title><author>Mi, W B ; Ye, T Y ; Wang, X C ; Tan, H ; Bai, H L</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i297t-a0fdabd22ca2190ca763b1ca421b32b3672d9a101d1b3c7986fbe7a2cf2b0ed63</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Curie temperature</topic><topic>Deposition by sputtering</topic><topic>Exact sciences and technology</topic><topic>Ferromagnetic materials</topic><topic>Magnetic fields</topic><topic>Magnetic properties</topic><topic>Magnetic properties and materials</topic><topic>Magnetic properties of monolayers and thin films</topic><topic>Magnetic properties of surface, thin films and multilayers</topic><topic>Magnetoresistance</topic><topic>Magnetoresistivity</topic><topic>Magnetotransport phenomena, materials for magnetotransport</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Physics</topic><topic>Saturation</topic><topic>Studies of specific magnetic materials</topic><topic>Transport</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Mi, W B</creatorcontrib><creatorcontrib>Ye, T Y</creatorcontrib><creatorcontrib>Wang, X C</creatorcontrib><creatorcontrib>Tan, H</creatorcontrib><creatorcontrib>Bai, H L</creatorcontrib><collection>Pascal-Francis</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of physics. D, Applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Mi, W B</au><au>Ye, T Y</au><au>Wang, X C</au><au>Tan, H</au><au>Bai, H L</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Electrical transport and magnetic properties of reactive sputtered polycrystalline Ti1−xCrxN films</atitle><jtitle>Journal of physics. D, Applied physics</jtitle><date>2010-10-20</date><risdate>2010</risdate><volume>43</volume><issue>41</issue><spage>415003</spage><epage>415003</epage><pages>415003-415003</pages><issn>0022-3727</issn><eissn>1361-6463</eissn><coden>JPAPBE</coden><abstract>The magnetoresistance (MR) and magnetic properties of (2 0 0) preferentially oriented Ti1-xCrxN films have been investigated systematically. All the films are ferromagnetic. The Curie temperature of the films is above 305 K, which is much higher than the previously reported value of 140 K in the Ti1-xCrxN systems. MR shows a weak saturation trend with the applied magnetic field, and increases significantly with a decrease in temperature below 50 K following the relation log</abstract><cop>Bristol</cop><pub>IOP Publishing</pub><doi>10.1088/0022-3727/43/41/415003</doi><tpages>1</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0022-3727 |
ispartof | Journal of physics. D, Applied physics, 2010-10, Vol.43 (41), p.415003-415003 |
issn | 0022-3727 1361-6463 |
language | eng |
recordid | cdi_proquest_miscellaneous_855688917 |
source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
subjects | Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Curie temperature Deposition by sputtering Exact sciences and technology Ferromagnetic materials Magnetic fields Magnetic properties Magnetic properties and materials Magnetic properties of monolayers and thin films Magnetic properties of surface, thin films and multilayers Magnetoresistance Magnetoresistivity Magnetotransport phenomena, materials for magnetotransport Materials science Methods of deposition of films and coatings film growth and epitaxy Physics Saturation Studies of specific magnetic materials Transport |
title | Electrical transport and magnetic properties of reactive sputtered polycrystalline Ti1−xCrxN films |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-08T14%3A55%3A48IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_iop_p&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Electrical%20transport%20and%20magnetic%20properties%20of%20reactive%20sputtered%20polycrystalline%20Ti1%E2%88%92xCrxN%20films&rft.jtitle=Journal%20of%20physics.%20D,%20Applied%20physics&rft.au=Mi,%20W%20B&rft.date=2010-10-20&rft.volume=43&rft.issue=41&rft.spage=415003&rft.epage=415003&rft.pages=415003-415003&rft.issn=0022-3727&rft.eissn=1361-6463&rft.coden=JPAPBE&rft_id=info:doi/10.1088/0022-3727/43/41/415003&rft_dat=%3Cproquest_iop_p%3E855688917%3C/proquest_iop_p%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=855688917&rft_id=info:pmid/&rfr_iscdi=true |