Electrical transport and magnetic properties of reactive sputtered polycrystalline Ti1−xCrxN films

The magnetoresistance (MR) and magnetic properties of (2 0 0) preferentially oriented Ti1-xCrxN films have been investigated systematically. All the films are ferromagnetic. The Curie temperature of the films is above 305 K, which is much higher than the previously reported value of 140 K in the Ti1...

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Veröffentlicht in:Journal of physics. D, Applied physics Applied physics, 2010-10, Vol.43 (41), p.415003-415003
Hauptverfasser: Mi, W B, Ye, T Y, Wang, X C, Tan, H, Bai, H L
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container_title Journal of physics. D, Applied physics
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creator Mi, W B
Ye, T Y
Wang, X C
Tan, H
Bai, H L
description The magnetoresistance (MR) and magnetic properties of (2 0 0) preferentially oriented Ti1-xCrxN films have been investigated systematically. All the films are ferromagnetic. The Curie temperature of the films is above 305 K, which is much higher than the previously reported value of 140 K in the Ti1-xCrxN systems. MR shows a weak saturation trend with the applied magnetic field, and increases significantly with a decrease in temperature below 50 K following the relation log
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fullrecord <record><control><sourceid>proquest_iop_p</sourceid><recordid>TN_cdi_proquest_miscellaneous_855688917</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>855688917</sourcerecordid><originalsourceid>FETCH-LOGICAL-i297t-a0fdabd22ca2190ca763b1ca421b32b3672d9a101d1b3c7986fbe7a2cf2b0ed63</originalsourceid><addsrcrecordid>eNptkM9KAzEQxoMoWP-8guQintZmku1m9yjFfyB6qecwm2Qlku6uSSr2DTz7iD6JKZVeFAaGYX7fMN9HyBmwS2B1PWWM80JILqelmJaQa8aY2CMTEBUUVVmJfTLZQYfkKMZXxtisqmFCzLW3OgWn0dMUsI_jEBLF3tAlvvQ2OU3HMIw2JGcjHToaLOrk3i2N4yolG6yh4-DXOqxjQu9db-nCwffn18c8fDzSzvllPCEHHfpoT3_7MXm-uV7M74qHp9v7-dVD4XgjU4GsM9gazjVyaJhGWYkWNJYcWsFbUUluGgQGJs9aNnXVtVYi1x1vmTWVOCYX27v55beVjUktXdTWe-ztsIqqnmXTdQMyk-e_JMZsvcvOtYtqDG6JYa24EDNZMsgcbDk3jLstMLUJXm0yVZtMVSlUCWobfNYUfzX_s2o0nfgBuVCGqw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>855688917</pqid></control><display><type>article</type><title>Electrical transport and magnetic properties of reactive sputtered polycrystalline Ti1−xCrxN films</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Mi, W B ; Ye, T Y ; Wang, X C ; Tan, H ; Bai, H L</creator><creatorcontrib>Mi, W B ; Ye, T Y ; Wang, X C ; Tan, H ; Bai, H L</creatorcontrib><description>The magnetoresistance (MR) and magnetic properties of (2 0 0) preferentially oriented Ti1-xCrxN films have been investigated systematically. All the films are ferromagnetic. The Curie temperature of the films is above 305 K, which is much higher than the previously reported value of 140 K in the Ti1-xCrxN systems. MR shows a weak saturation trend with the applied magnetic field, and increases significantly with a decrease in temperature below 50 K following the relation log</description><identifier>ISSN: 0022-3727</identifier><identifier>EISSN: 1361-6463</identifier><identifier>DOI: 10.1088/0022-3727/43/41/415003</identifier><identifier>CODEN: JPAPBE</identifier><language>eng</language><publisher>Bristol: IOP Publishing</publisher><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Cross-disciplinary physics: materials science; rheology ; Curie temperature ; Deposition by sputtering ; Exact sciences and technology ; Ferromagnetic materials ; Magnetic fields ; Magnetic properties ; Magnetic properties and materials ; Magnetic properties of monolayers and thin films ; Magnetic properties of surface, thin films and multilayers ; Magnetoresistance ; Magnetoresistivity ; Magnetotransport phenomena, materials for magnetotransport ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Physics ; Saturation ; Studies of specific magnetic materials ; Transport</subject><ispartof>Journal of physics. D, Applied physics, 2010-10, Vol.43 (41), p.415003-415003</ispartof><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.1088/0022-3727/43/41/415003/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,780,784,27923,27924,53829,53909</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=23357401$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Mi, W B</creatorcontrib><creatorcontrib>Ye, T Y</creatorcontrib><creatorcontrib>Wang, X C</creatorcontrib><creatorcontrib>Tan, H</creatorcontrib><creatorcontrib>Bai, H L</creatorcontrib><title>Electrical transport and magnetic properties of reactive sputtered polycrystalline Ti1−xCrxN films</title><title>Journal of physics. D, Applied physics</title><description>The magnetoresistance (MR) and magnetic properties of (2 0 0) preferentially oriented Ti1-xCrxN films have been investigated systematically. All the films are ferromagnetic. The Curie temperature of the films is above 305 K, which is much higher than the previously reported value of 140 K in the Ti1-xCrxN systems. MR shows a weak saturation trend with the applied magnetic field, and increases significantly with a decrease in temperature below 50 K following the relation log</description><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Curie temperature</subject><subject>Deposition by sputtering</subject><subject>Exact sciences and technology</subject><subject>Ferromagnetic materials</subject><subject>Magnetic fields</subject><subject>Magnetic properties</subject><subject>Magnetic properties and materials</subject><subject>Magnetic properties of monolayers and thin films</subject><subject>Magnetic properties of surface, thin films and multilayers</subject><subject>Magnetoresistance</subject><subject>Magnetoresistivity</subject><subject>Magnetotransport phenomena, materials for magnetotransport</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Physics</subject><subject>Saturation</subject><subject>Studies of specific magnetic materials</subject><subject>Transport</subject><issn>0022-3727</issn><issn>1361-6463</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNptkM9KAzEQxoMoWP-8guQintZmku1m9yjFfyB6qecwm2Qlku6uSSr2DTz7iD6JKZVeFAaGYX7fMN9HyBmwS2B1PWWM80JILqelmJaQa8aY2CMTEBUUVVmJfTLZQYfkKMZXxtisqmFCzLW3OgWn0dMUsI_jEBLF3tAlvvQ2OU3HMIw2JGcjHToaLOrk3i2N4yolG6yh4-DXOqxjQu9db-nCwffn18c8fDzSzvllPCEHHfpoT3_7MXm-uV7M74qHp9v7-dVD4XgjU4GsM9gazjVyaJhGWYkWNJYcWsFbUUluGgQGJs9aNnXVtVYi1x1vmTWVOCYX27v55beVjUktXdTWe-ztsIqqnmXTdQMyk-e_JMZsvcvOtYtqDG6JYa24EDNZMsgcbDk3jLstMLUJXm0yVZtMVSlUCWobfNYUfzX_s2o0nfgBuVCGqw</recordid><startdate>20101020</startdate><enddate>20101020</enddate><creator>Mi, W B</creator><creator>Ye, T Y</creator><creator>Wang, X C</creator><creator>Tan, H</creator><creator>Bai, H L</creator><general>IOP Publishing</general><general>Institute of Physics</general><scope>IQODW</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20101020</creationdate><title>Electrical transport and magnetic properties of reactive sputtered polycrystalline Ti1−xCrxN films</title><author>Mi, W B ; Ye, T Y ; Wang, X C ; Tan, H ; Bai, H L</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i297t-a0fdabd22ca2190ca763b1ca421b32b3672d9a101d1b3c7986fbe7a2cf2b0ed63</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Curie temperature</topic><topic>Deposition by sputtering</topic><topic>Exact sciences and technology</topic><topic>Ferromagnetic materials</topic><topic>Magnetic fields</topic><topic>Magnetic properties</topic><topic>Magnetic properties and materials</topic><topic>Magnetic properties of monolayers and thin films</topic><topic>Magnetic properties of surface, thin films and multilayers</topic><topic>Magnetoresistance</topic><topic>Magnetoresistivity</topic><topic>Magnetotransport phenomena, materials for magnetotransport</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Physics</topic><topic>Saturation</topic><topic>Studies of specific magnetic materials</topic><topic>Transport</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Mi, W B</creatorcontrib><creatorcontrib>Ye, T Y</creatorcontrib><creatorcontrib>Wang, X C</creatorcontrib><creatorcontrib>Tan, H</creatorcontrib><creatorcontrib>Bai, H L</creatorcontrib><collection>Pascal-Francis</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of physics. D, Applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Mi, W B</au><au>Ye, T Y</au><au>Wang, X C</au><au>Tan, H</au><au>Bai, H L</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Electrical transport and magnetic properties of reactive sputtered polycrystalline Ti1−xCrxN films</atitle><jtitle>Journal of physics. D, Applied physics</jtitle><date>2010-10-20</date><risdate>2010</risdate><volume>43</volume><issue>41</issue><spage>415003</spage><epage>415003</epage><pages>415003-415003</pages><issn>0022-3727</issn><eissn>1361-6463</eissn><coden>JPAPBE</coden><abstract>The magnetoresistance (MR) and magnetic properties of (2 0 0) preferentially oriented Ti1-xCrxN films have been investigated systematically. All the films are ferromagnetic. The Curie temperature of the films is above 305 K, which is much higher than the previously reported value of 140 K in the Ti1-xCrxN systems. MR shows a weak saturation trend with the applied magnetic field, and increases significantly with a decrease in temperature below 50 K following the relation log</abstract><cop>Bristol</cop><pub>IOP Publishing</pub><doi>10.1088/0022-3727/43/41/415003</doi><tpages>1</tpages></addata></record>
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subjects Condensed matter: electronic structure, electrical, magnetic, and optical properties
Cross-disciplinary physics: materials science
rheology
Curie temperature
Deposition by sputtering
Exact sciences and technology
Ferromagnetic materials
Magnetic fields
Magnetic properties
Magnetic properties and materials
Magnetic properties of monolayers and thin films
Magnetic properties of surface, thin films and multilayers
Magnetoresistance
Magnetoresistivity
Magnetotransport phenomena, materials for magnetotransport
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Saturation
Studies of specific magnetic materials
Transport
title Electrical transport and magnetic properties of reactive sputtered polycrystalline Ti1−xCrxN films
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-08T14%3A55%3A48IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_iop_p&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Electrical%20transport%20and%20magnetic%20properties%20of%20reactive%20sputtered%20polycrystalline%20Ti1%E2%88%92xCrxN%20films&rft.jtitle=Journal%20of%20physics.%20D,%20Applied%20physics&rft.au=Mi,%20W%20B&rft.date=2010-10-20&rft.volume=43&rft.issue=41&rft.spage=415003&rft.epage=415003&rft.pages=415003-415003&rft.issn=0022-3727&rft.eissn=1361-6463&rft.coden=JPAPBE&rft_id=info:doi/10.1088/0022-3727/43/41/415003&rft_dat=%3Cproquest_iop_p%3E855688917%3C/proquest_iop_p%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=855688917&rft_id=info:pmid/&rfr_iscdi=true