Effect of bias voltage on growth property of Cr-DLC film prepared by linear ion beam deposition technique

Cr-containing diamond-like carbon films were deposited on silicon wafers by a combined linear ion beam and DC magnetron sputtering. The influence of the bias voltage on the growth rate, atomic bond structure, surface topography and mechanical properties of the films were investigated by SEM, XPS, Ra...

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Veröffentlicht in:	Vacuum 2010-08, Vol.85 (2), p.231-235
Hauptverfasser:	Dai, Wei, Zheng, He, Wu, Guosong, Wang, Aiying
Format:	Artikel
Sprache:	eng
Schlagworte:	Atomic bond structure Bias Bias voltage Chromium Cr-DLC Deposition Electric potential Ion beams Nanostructure Properties Surface topography Topography Voltage
Online-Zugang:	Volltext
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