Continuous roll-to-flat thermal imprinting process for large-area micro-pattern replication on polymer substrate

Conventional imprinting process in flat-pressing mode meets with the problem of limited efficiency as a discontinuous batch-wise process in many new applications that demand micro-/nano pattern replication over large area with low cost and high throughout in mass production manufacturing. To overcom...

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Veröffentlicht in:Microelectronic engineering 2010-12, Vol.87 (12), p.2596-2601
Hauptverfasser: Lan, Shuhuai, Song, Jung-Han, Lee, Moon G., Ni, Jun, Lee, Nak Kyu, Lee, Hye-Jin
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Sprache:eng
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