Low refractive index silicon oxide coatings at room temperature using atmospheric-pressure very high-frequency plasma
Low refractive index silicon oxide films were deposited using atmospheric-pressure He/SiH 4/CO 2 plasma excited by a 150-MHz very high-frequency power. Significant increase in deposition rate at room temperature could prevent the formation of dense SiO 2 network, decreasing refractive index of the r...
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| Veröffentlicht in: | Thin solid films 2010-10, Vol.519 (1), p.235-239 |
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| container_title | Thin solid films |
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| creator | Kakiuchi, H. Ohmi, H. Yamaguchi, Y. Nakamura, K. Yasutake, K. |
| description | Low refractive index silicon oxide films were deposited using atmospheric-pressure He/SiH
4/CO
2 plasma excited by a 150-MHz very high-frequency power. Significant increase in deposition rate at room temperature could prevent the formation of dense SiO
2 network, decreasing refractive index of the resulting film effectively. As a result, a silicon oxide film with the lowest refractive index,
n
=
1.24 at 632.8
nm, was obtained with a very high deposition rate of 235
nm/s. The reflectance and transmittance spectra showed that the low refractive index film functioned as a quarter-wave anti-reflection coating of a glass substrate. |
| doi_str_mv | 10.1016/j.tsf.2010.08.003 |
| format | Article |
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4/CO
2 plasma excited by a 150-MHz very high-frequency power. Significant increase in deposition rate at room temperature could prevent the formation of dense SiO
2 network, decreasing refractive index of the resulting film effectively. As a result, a silicon oxide film with the lowest refractive index,
n
=
1.24 at 632.8
nm, was obtained with a very high deposition rate of 235
nm/s. The reflectance and transmittance spectra showed that the low refractive index film functioned as a quarter-wave anti-reflection coating of a glass substrate.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/j.tsf.2010.08.003</identifier><identifier>CODEN: THSFAP</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Carbon dioxide ; Coatings ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Cross-disciplinary physics: materials science; rheology ; Deposition ; Ellipsometry ; Exact sciences and technology ; Infrared spectroscopy ; Instruments, apparatus, components and techniques common to several branches of physics and astronomy ; Ion and electron beam-assisted deposition; ion plating ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Optical instruments, equipment and techniques ; Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation ; Optical properties of specific thin films ; Physics ; Physics of gases, plasmas and electric discharges ; Physics of plasmas and electric discharges ; Plasma applications ; Plasma processing and deposition ; Plasma-based ion implantation and deposition ; Polarimeters and ellipsometers ; Reflectivity ; Refractive index ; Refractivity ; Silicon oxide ; Silicon oxides ; Spectra ; Structural properties ; Transmittance</subject><ispartof>Thin solid films, 2010-10, Vol.519 (1), p.235-239</ispartof><rights>2010 Elsevier B.V.</rights><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c425t-f15876bb6e863d78ed73da8f3ecac3c5b25066d91e8fd6e46be03d300cd86c803</citedby><cites>FETCH-LOGICAL-c425t-f15876bb6e863d78ed73da8f3ecac3c5b25066d91e8fd6e46be03d300cd86c803</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/S004060901001117X$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,776,780,3537,27901,27902,65306</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=24104939$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Kakiuchi, H.</creatorcontrib><creatorcontrib>Ohmi, H.</creatorcontrib><creatorcontrib>Yamaguchi, Y.</creatorcontrib><creatorcontrib>Nakamura, K.</creatorcontrib><creatorcontrib>Yasutake, K.</creatorcontrib><title>Low refractive index silicon oxide coatings at room temperature using atmospheric-pressure very high-frequency plasma</title><title>Thin solid films</title><description>Low refractive index silicon oxide films were deposited using atmospheric-pressure He/SiH
4/CO
2 plasma excited by a 150-MHz very high-frequency power. Significant increase in deposition rate at room temperature could prevent the formation of dense SiO
2 network, decreasing refractive index of the resulting film effectively. As a result, a silicon oxide film with the lowest refractive index,
n
=
1.24 at 632.8
nm, was obtained with a very high deposition rate of 235
nm/s. The reflectance and transmittance spectra showed that the low refractive index film functioned as a quarter-wave anti-reflection coating of a glass substrate.</description><subject>Carbon dioxide</subject><subject>Coatings</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Deposition</subject><subject>Ellipsometry</subject><subject>Exact sciences and technology</subject><subject>Infrared spectroscopy</subject><subject>Instruments, apparatus, components and techniques common to several branches of physics and astronomy</subject><subject>Ion and electron beam-assisted deposition; ion plating</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Optical instruments, equipment and techniques</subject><subject>Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation</subject><subject>Optical properties of specific thin films</subject><subject>Physics</subject><subject>Physics of gases, plasmas and electric discharges</subject><subject>Physics of plasmas and electric discharges</subject><subject>Plasma applications</subject><subject>Plasma processing and deposition</subject><subject>Plasma-based ion implantation and deposition</subject><subject>Polarimeters and ellipsometers</subject><subject>Reflectivity</subject><subject>Refractive index</subject><subject>Refractivity</subject><subject>Silicon oxide</subject><subject>Silicon oxides</subject><subject>Spectra</subject><subject>Structural properties</subject><subject>Transmittance</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNp9kD9v2zAQxYmiAeqm-QDZuBSd5B5FmaLQqQjapoCBLOlM0OQppiGJKo9y428fGg46Zjoc3nv358fYrYC1AKG-HtaZ-nUNpQe9BpDv2ErotqvqVor3bAXQQKWggw_sI9EBAERdyxVbtvEfT9gn63I4Ig-Tx2dOYQguTjw-B4_cRZvD9ETcZp5iHHnGccZk85KQL1SkooyR5j2m4Ko5IdFZOmI68X142ld9wr8LTu7E58HSaD-xq94OhDev9Zr9-fnj8e6-2j78-n33fVu5pt7kqhcb3ardTqFW0rcafSu91b1EZ510m129AaV8J1D3XmGjdgjSSwDntXIa5DX7cpk7p1gOoGzGQA6HwU4YFzK66RoFLZyd4uJ0KRIVIGZOYbTpZASYM2FzMIWwORM2oE2JlMzn1-mWnB0Kw8kF-h-sGwFNJ7vi-3bxYXn1GDAZcqHQQB8Sumx8DG9seQHHYZQ8</recordid><startdate>20101029</startdate><enddate>20101029</enddate><creator>Kakiuchi, H.</creator><creator>Ohmi, H.</creator><creator>Yamaguchi, Y.</creator><creator>Nakamura, K.</creator><creator>Yasutake, K.</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20101029</creationdate><title>Low refractive index silicon oxide coatings at room temperature using atmospheric-pressure very high-frequency plasma</title><author>Kakiuchi, H. ; Ohmi, H. ; Yamaguchi, Y. ; Nakamura, K. ; Yasutake, K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c425t-f15876bb6e863d78ed73da8f3ecac3c5b25066d91e8fd6e46be03d300cd86c803</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Carbon dioxide</topic><topic>Coatings</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Deposition</topic><topic>Ellipsometry</topic><topic>Exact sciences and technology</topic><topic>Infrared spectroscopy</topic><topic>Instruments, apparatus, components and techniques common to several branches of physics and astronomy</topic><topic>Ion and electron beam-assisted deposition; ion plating</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Optical instruments, equipment and techniques</topic><topic>Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation</topic><topic>Optical properties of specific thin films</topic><topic>Physics</topic><topic>Physics of gases, plasmas and electric discharges</topic><topic>Physics of plasmas and electric discharges</topic><topic>Plasma applications</topic><topic>Plasma processing and deposition</topic><topic>Plasma-based ion implantation and deposition</topic><topic>Polarimeters and ellipsometers</topic><topic>Reflectivity</topic><topic>Refractive index</topic><topic>Refractivity</topic><topic>Silicon oxide</topic><topic>Silicon oxides</topic><topic>Spectra</topic><topic>Structural properties</topic><topic>Transmittance</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kakiuchi, H.</creatorcontrib><creatorcontrib>Ohmi, H.</creatorcontrib><creatorcontrib>Yamaguchi, Y.</creatorcontrib><creatorcontrib>Nakamura, K.</creatorcontrib><creatorcontrib>Yasutake, K.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kakiuchi, H.</au><au>Ohmi, H.</au><au>Yamaguchi, Y.</au><au>Nakamura, K.</au><au>Yasutake, K.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Low refractive index silicon oxide coatings at room temperature using atmospheric-pressure very high-frequency plasma</atitle><jtitle>Thin solid films</jtitle><date>2010-10-29</date><risdate>2010</risdate><volume>519</volume><issue>1</issue><spage>235</spage><epage>239</epage><pages>235-239</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><abstract>Low refractive index silicon oxide films were deposited using atmospheric-pressure He/SiH
4/CO
2 plasma excited by a 150-MHz very high-frequency power. Significant increase in deposition rate at room temperature could prevent the formation of dense SiO
2 network, decreasing refractive index of the resulting film effectively. As a result, a silicon oxide film with the lowest refractive index,
n
=
1.24 at 632.8
nm, was obtained with a very high deposition rate of 235
nm/s. The reflectance and transmittance spectra showed that the low refractive index film functioned as a quarter-wave anti-reflection coating of a glass substrate.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.tsf.2010.08.003</doi><tpages>5</tpages></addata></record> |
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| source | Elsevier ScienceDirect Journals Complete |
| subjects | Carbon dioxide Coatings Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Deposition Ellipsometry Exact sciences and technology Infrared spectroscopy Instruments, apparatus, components and techniques common to several branches of physics and astronomy Ion and electron beam-assisted deposition ion plating Materials science Methods of deposition of films and coatings film growth and epitaxy Optical instruments, equipment and techniques Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Optical properties of specific thin films Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma applications Plasma processing and deposition Plasma-based ion implantation and deposition Polarimeters and ellipsometers Reflectivity Refractive index Refractivity Silicon oxide Silicon oxides Spectra Structural properties Transmittance |
| title | Low refractive index silicon oxide coatings at room temperature using atmospheric-pressure very high-frequency plasma |
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