Resolution and Sensitivity of a Resist with and without Hexamethyldisilazane Determined Using Profilometry

We evaluated the resolution and sensitivity of a resist with and without hexamethyldisilazane (HMDS), which improves resist adhesion to substrates, by using profilometry. HMDS was spin-coated onto a Si wafer by using a spin coater. The resist with HMDS was always thicker than that without HMDS for t...

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Veröffentlicht in:	Journal of Photopolymer Science and Technology 2006, Vol.19(1), pp.75-80
Hauptverfasser:	Horibe, Hideo, Yamamoto, Masashi, Takamatsu, Shinya, Ichikawa, Tomokazu
Format:	Artikel
Sprache:	eng
Schlagworte:	Adhesion tests antireflection coating Antireflection coatings Coating film-thickness meter hexamethyldisilazane Hydroxyl groups Photopolymers resist pattern profile Resists resolution sensitivity Silicon Silicon substrates
Online-Zugang:	Volltext
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