Doubly patternable epoxy based sol–gel structures by UV and soft lithography

The sol–gel synthesis of hybrid materials offers special opportunities to combine polymer and glass properties and to create promising candidates for photonic applications. We report on the optical and morphological characterization of a new photosensitive epoxy based sol–gel system. Germanium ethox...

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Veröffentlicht in:	Solid state sciences 2010-11, Vol.12 (11), p.1890-1893
Hauptverfasser:	Della Giustina, G., Brusatin, G., Guglielmi, M., Palazzesi, C., Orsini, E., Prosposito, P.
Format:	Artikel
Sprache:	eng
Schlagworte:	Coatings Cross-disciplinary physics: materials science rheology Epoxy Exact sciences and technology Exposure Glass Glycidoxypropyltrimethoxysilane Hybrid organic-inorganic materials Imprinting Lithography Materials science Materials synthesis materials processing Other materials Patterning Photonics Physics Silicon substrates Sol gel process Sol–gel Specific materials UV lithography
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