Microwave atomic force microscopy imaging for nanometer-scale electrical property characterization

Microwave atomic force microscopy imaging for nanometer-scale electrical property characterization

We introduce a new type of microscopy which is capable of investigating surface topography and electrical property of conductive and dielectric materials simultaneously on a nanometer scale. The microwave atomic force microscopy is a combination of the principles of the scanning probe microscope and...

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Veröffentlicht in:Review of scientific instruments 2010-12, Vol.81 (12), p.123708-123708-4
Hauptverfasser: Zhang, Lan, Ju, Yang, Hosoi, Atsushi, Fujimoto, Akifumi
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creator Zhang, Lan
Ju, Yang
Hosoi, Atsushi
Fujimoto, Akifumi
description We introduce a new type of microscopy which is capable of investigating surface topography and electrical property of conductive and dielectric materials simultaneously on a nanometer scale. The microwave atomic force microscopy is a combination of the principles of the scanning probe microscope and the microwave-measurement technique. As a result, under the noncontact AFM working conditions, we successfully generated a microwave image of a 200-nm Au film coating on a glass wafer substrate with a spatial resolution of 120 nm and a measured voltage difference of 19.2 mV between the two materials.
doi_str_mv 10.1063/1.3525058
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title Microwave atomic force microscopy imaging for nanometer-scale electrical property characterization
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