Effect of potential on the early stages of nucleation and growth during cobalt electrocrystallization in sulfate medium onto FTO surface
The electrodeposition of Co thin films onto a fluorine-doped tin oxide (FTO)-coated conducting glass substrate from sulfate solutions was investigated using cyclic voltammetry, and chronoamperometry measurements. The Scharifker and Hills model was used to analyze current transients. At relatively lo...
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| Veröffentlicht in: | Materials letters 2010-11, Vol.64 (21), p.2403-2406 |
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| container_title | Materials letters |
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| creator | Mentar, L. Khelladi, M.R. Azizi, A. Kahoul, A. |
| description | The electrodeposition of Co thin films onto a fluorine-doped tin oxide (FTO)-coated conducting glass substrate from sulfate solutions was investigated using cyclic voltammetry, and chronoamperometry measurements. The Scharifker and Hills model was used to analyze current transients. At relatively low overpotentials, the Co deposition can be described by a model involving instantaneous nucleation on active sites and diffusion-controlled 3D growth. The values of kinetic parameters, number density of active sites N∞, and diffusion coefficient D for Co2+ ions are also calculated. |
| doi_str_mv | 10.1016/j.matlet.2010.07.055 |
| format | Article |
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The Scharifker and Hills model was used to analyze current transients. At relatively low overpotentials, the Co deposition can be described by a model involving instantaneous nucleation on active sites and diffusion-controlled 3D growth. The values of kinetic parameters, number density of active sites N∞, and diffusion coefficient D for Co2+ ions are also calculated.</description><identifier>ISSN: 0167-577X</identifier><identifier>EISSN: 1873-4979</identifier><identifier>DOI: 10.1016/j.matlet.2010.07.055</identifier><language>eng</language><publisher>Elsevier B.V</publisher><subject>Chronoamperometry ; Cobalt ; Cyclic voltammetry ; Density ; Deposition ; Diffusion coefficient ; Electrocrystallization ; FTO ; Mathematical models ; Nucleation ; Sulfates ; Thin films ; Three dimensional ; Tin oxides</subject><ispartof>Materials letters, 2010-11, Vol.64 (21), p.2403-2406</ispartof><rights>2010 Elsevier B.V.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c338t-fe280a8a693e7dcf5fc4404ea31e4211793f5d93182b78d1feb296b4f78a59223</citedby><cites>FETCH-LOGICAL-c338t-fe280a8a693e7dcf5fc4404ea31e4211793f5d93182b78d1feb296b4f78a59223</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.matlet.2010.07.055$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3541,27915,27916,45986</link.rule.ids></links><search><creatorcontrib>Mentar, L.</creatorcontrib><creatorcontrib>Khelladi, M.R.</creatorcontrib><creatorcontrib>Azizi, A.</creatorcontrib><creatorcontrib>Kahoul, A.</creatorcontrib><title>Effect of potential on the early stages of nucleation and growth during cobalt electrocrystallization in sulfate medium onto FTO surface</title><title>Materials letters</title><description>The electrodeposition of Co thin films onto a fluorine-doped tin oxide (FTO)-coated conducting glass substrate from sulfate solutions was investigated using cyclic voltammetry, and chronoamperometry measurements. 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The values of kinetic parameters, number density of active sites N∞, and diffusion coefficient D for Co2+ ions are also calculated.</description><subject>Chronoamperometry</subject><subject>Cobalt</subject><subject>Cyclic voltammetry</subject><subject>Density</subject><subject>Deposition</subject><subject>Diffusion coefficient</subject><subject>Electrocrystallization</subject><subject>FTO</subject><subject>Mathematical models</subject><subject>Nucleation</subject><subject>Sulfates</subject><subject>Thin films</subject><subject>Three dimensional</subject><subject>Tin oxides</subject><issn>0167-577X</issn><issn>1873-4979</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNp9kMFKxDAURYMoOI7-gYvsXLUmbTppNoLIjAqCGwV3IZO-jBnSZkxSZfwCP9sMde0q8HLufbyD0CUlJSV0cb0te5UcpLIieUR4SZrmCM1oy-uCCS6O0SxjvGg4fztFZzFuCSFMEDZDP0tjQCfsDd75BEOyymE_4PQOGFRwexyT2kA8AMOoHahk87caOrwJ_iu9424Mdthg7dfKJQwutwWvwz7nnLPfE28HHEdnVALcQ2fHPu9IHq9envM8GKXhHJ0Y5SJc_L1z9Lpavtw9FE_P9493t0-Frus2FQaqlqhWLUQNvNOmMZoxwkDVFFhFKRe1aTpR07Za87ajBtaVWKyZ4a1qRFXVc3Q19e6C_xghJtnbqME5NYAfo-QtrxpCBckkm0gdfIwBjNwF26uwl5TIg3e5lZN3efAuCZfZe47dTDHIV3xaCDJqC4POZ4fsRnbe_l_wC-t9kQs</recordid><startdate>20101115</startdate><enddate>20101115</enddate><creator>Mentar, L.</creator><creator>Khelladi, M.R.</creator><creator>Azizi, A.</creator><creator>Kahoul, A.</creator><general>Elsevier B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20101115</creationdate><title>Effect of potential on the early stages of nucleation and growth during cobalt electrocrystallization in sulfate medium onto FTO surface</title><author>Mentar, L. ; Khelladi, M.R. ; Azizi, A. ; Kahoul, A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c338t-fe280a8a693e7dcf5fc4404ea31e4211793f5d93182b78d1feb296b4f78a59223</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Chronoamperometry</topic><topic>Cobalt</topic><topic>Cyclic voltammetry</topic><topic>Density</topic><topic>Deposition</topic><topic>Diffusion coefficient</topic><topic>Electrocrystallization</topic><topic>FTO</topic><topic>Mathematical models</topic><topic>Nucleation</topic><topic>Sulfates</topic><topic>Thin films</topic><topic>Three dimensional</topic><topic>Tin oxides</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Mentar, L.</creatorcontrib><creatorcontrib>Khelladi, M.R.</creatorcontrib><creatorcontrib>Azizi, A.</creatorcontrib><creatorcontrib>Kahoul, A.</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Materials letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Mentar, L.</au><au>Khelladi, M.R.</au><au>Azizi, A.</au><au>Kahoul, A.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effect of potential on the early stages of nucleation and growth during cobalt electrocrystallization in sulfate medium onto FTO surface</atitle><jtitle>Materials letters</jtitle><date>2010-11-15</date><risdate>2010</risdate><volume>64</volume><issue>21</issue><spage>2403</spage><epage>2406</epage><pages>2403-2406</pages><issn>0167-577X</issn><eissn>1873-4979</eissn><abstract>The electrodeposition of Co thin films onto a fluorine-doped tin oxide (FTO)-coated conducting glass substrate from sulfate solutions was investigated using cyclic voltammetry, and chronoamperometry measurements. The Scharifker and Hills model was used to analyze current transients. At relatively low overpotentials, the Co deposition can be described by a model involving instantaneous nucleation on active sites and diffusion-controlled 3D growth. The values of kinetic parameters, number density of active sites N∞, and diffusion coefficient D for Co2+ ions are also calculated.</abstract><pub>Elsevier B.V</pub><doi>10.1016/j.matlet.2010.07.055</doi><tpages>4</tpages></addata></record> |
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| ispartof | Materials letters, 2010-11, Vol.64 (21), p.2403-2406 |
| issn | 0167-577X 1873-4979 |
| language | eng |
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| source | ScienceDirect Journals (5 years ago - present) |
| subjects | Chronoamperometry Cobalt Cyclic voltammetry Density Deposition Diffusion coefficient Electrocrystallization FTO Mathematical models Nucleation Sulfates Thin films Three dimensional Tin oxides |
| title | Effect of potential on the early stages of nucleation and growth during cobalt electrocrystallization in sulfate medium onto FTO surface |
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