Treatment of nanocrystalline diamond films by nitrogen implantation using PIII processing

The influence of N 2 Plasma Immersion Ion Implantation (PIII) on undoped nanocrystalline diamond (NCD) films grown on silicon substrate by CVD process using a hot filament reactor was systematically studied. Before and after the implantation, NCD films were investigated using scanning electron micro...

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Veröffentlicht in:	Surface & coatings technology 2010-06, Vol.204 (18), p.3034-3038
Hauptverfasser:	Miranda, C.R.B., Ueda, M., Baldan, M.R., Beloto, A.F., Ferreira, N.G.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Chemical vapor deposition Cross-disciplinary physics: materials science rheology Diamond Electrochemical properties Electrodes Exact sciences and technology Filaments Immersion Implantation Ion implantation technology Materials science Metals. Metallurgy Methods of deposition of films and coatings film growth and epitaxy Morphology Nanocrystals Other surface treatments Physics Production techniques Scanning electron microscopy Silicon substrates Surface treatment Surface treatments
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