Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
Titanium dioxide (TiO2) thin films were prepared on Galvanized Iron (GI) substrate by plasma-enhanced atomic layer deposition (PE-ALD) using tetrakis-dimethylamido titanium and O2 plasma to investigate the photocatalytic activities. The PE-ALD TiO2 thin films exhibited relatively high growth rate an...
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| Veröffentlicht in: | Thin solid films 2010-06, Vol.518 (17), p.4757-4761 |
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| creator | LEE, Chang-Soo KIM, Jungwon GIL HO GU JO, Du-Hwan CHAN GYUNG PARK CHOI, Wonyong KIM, Hyungjun |
| description | Titanium dioxide (TiO2) thin films were prepared on Galvanized Iron (GI) substrate by plasma-enhanced atomic layer deposition (PE-ALD) using tetrakis-dimethylamido titanium and O2 plasma to investigate the photocatalytic activities. The PE-ALD TiO2 thin films exhibited relatively high growth rate and the crystal structures of TiO2 thin films depended on the growth temperatures. TiO2 thin films deposited at 200A degree C have amorphous phase, whereas those with anatase phase and bandgap energy about 3.2eV were deposited at growth temperature of 250A degree C and 300A degree C. From contact angles measurement of water droplet, TiO2 thin films with anatase phase and Activ registered glass exhibited superhydrophilic surfaces after UV light exposure. And from photo-induced degradation test of organic solution, anatase TiO2 thin films and Activ registered glass decomposed organic solution under UV illumination. The anatase TiO2 thin film on GI substrate showed higher photocatalytic efficiency than Activ registered glass after 5h UV light exposure. Thus, we suggest that the anatase phase in TiO2 thin film contributes to both superhydrophilicity and photocatalytic decomposition of 4-chlorophenol solution and anatase TiO2 thin films are suitable for self-cleaning applications. |
| doi_str_mv | 10.1016/j.tsf.2010.01.015 |
| format | Article |
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The PE-ALD TiO2 thin films exhibited relatively high growth rate and the crystal structures of TiO2 thin films depended on the growth temperatures. TiO2 thin films deposited at 200A degree C have amorphous phase, whereas those with anatase phase and bandgap energy about 3.2eV were deposited at growth temperature of 250A degree C and 300A degree C. From contact angles measurement of water droplet, TiO2 thin films with anatase phase and Activ registered glass exhibited superhydrophilic surfaces after UV light exposure. And from photo-induced degradation test of organic solution, anatase TiO2 thin films and Activ registered glass decomposed organic solution under UV illumination. The anatase TiO2 thin film on GI substrate showed higher photocatalytic efficiency than Activ registered glass after 5h UV light exposure. Thus, we suggest that the anatase phase in TiO2 thin film contributes to both superhydrophilicity and photocatalytic decomposition of 4-chlorophenol solution and anatase TiO2 thin films are suitable for self-cleaning applications.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/j.tsf.2010.01.015</identifier><identifier>CODEN: THSFAP</identifier><language>eng</language><publisher>Amsterdam: Elsevier</publisher><subject>Anatase ; Catalysis ; Catalysts: preparations and properties ; Chemistry ; Cross-disciplinary physics: materials science; rheology ; Decomposition ; Deposition ; Droplets ; Exact sciences and technology ; Galvanized iron ; General and physical chemistry ; General, apparatus ; Glass ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Photocatalysis ; Physics ; Surface physical chemistry ; Theory and models of film growth ; Theory of reactions, general kinetics. Catalysis. Nomenclature, chemical documentation, computer chemistry ; Thin films ; Titanium dioxide ; Vapor phase epitaxy; growth from vapor phase</subject><ispartof>Thin solid films, 2010-06, Vol.518 (17), p.4757-4761</ispartof><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c307t-7824082d842d542edfbb7b1ef7f2c04679f2720c4f590f05c37c7a83316810b23</citedby><cites>FETCH-LOGICAL-c307t-7824082d842d542edfbb7b1ef7f2c04679f2720c4f590f05c37c7a83316810b23</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27903,27904</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=22932558$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>LEE, Chang-Soo</creatorcontrib><creatorcontrib>KIM, Jungwon</creatorcontrib><creatorcontrib>GIL HO GU</creatorcontrib><creatorcontrib>JO, Du-Hwan</creatorcontrib><creatorcontrib>CHAN GYUNG PARK</creatorcontrib><creatorcontrib>CHOI, Wonyong</creatorcontrib><creatorcontrib>KIM, Hyungjun</creatorcontrib><title>Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition</title><title>Thin solid films</title><description>Titanium dioxide (TiO2) thin films were prepared on Galvanized Iron (GI) substrate by plasma-enhanced atomic layer deposition (PE-ALD) using tetrakis-dimethylamido titanium and O2 plasma to investigate the photocatalytic activities. The PE-ALD TiO2 thin films exhibited relatively high growth rate and the crystal structures of TiO2 thin films depended on the growth temperatures. TiO2 thin films deposited at 200A degree C have amorphous phase, whereas those with anatase phase and bandgap energy about 3.2eV were deposited at growth temperature of 250A degree C and 300A degree C. From contact angles measurement of water droplet, TiO2 thin films with anatase phase and Activ registered glass exhibited superhydrophilic surfaces after UV light exposure. And from photo-induced degradation test of organic solution, anatase TiO2 thin films and Activ registered glass decomposed organic solution under UV illumination. The anatase TiO2 thin film on GI substrate showed higher photocatalytic efficiency than Activ registered glass after 5h UV light exposure. Thus, we suggest that the anatase phase in TiO2 thin film contributes to both superhydrophilicity and photocatalytic decomposition of 4-chlorophenol solution and anatase TiO2 thin films are suitable for self-cleaning applications.</description><subject>Anatase</subject><subject>Catalysis</subject><subject>Catalysts: preparations and properties</subject><subject>Chemistry</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Decomposition</subject><subject>Deposition</subject><subject>Droplets</subject><subject>Exact sciences and technology</subject><subject>Galvanized iron</subject><subject>General and physical chemistry</subject><subject>General, apparatus</subject><subject>Glass</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Photocatalysis</subject><subject>Physics</subject><subject>Surface physical chemistry</subject><subject>Theory and models of film growth</subject><subject>Theory of reactions, general kinetics. Catalysis. Nomenclature, chemical documentation, computer chemistry</subject><subject>Thin films</subject><subject>Titanium dioxide</subject><subject>Vapor phase epitaxy; growth from vapor phase</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNo9UMFq3DAUFKGFbNN-QG-6lJ68eZLslX0soU0DgeSQnMWzLLFaZMvV0wa20H-vloTAwGNgZh4zjH0VsBUgdteHbSG_lVA5iIrugm1Er4dGaiU-sA1AC80OBrhkn4gOACCkVBv273GfSrJYMJ5KsBxtCS-hBEc8ef4UHiQv-7BwH-JMfM1uxewmnhZ-i_EFl_C3srtcOR1HKhmL4-OJrxFpxsYte1xsVWBJc02PeHKZT25NVH-k5TP76DGS-_J2r9jzr59PN7-b-4fbu5sf941VoEuje9lCL6e-lVPXSjf5cdSjcF57aaHd6cFLLcG2vhvAQ2eVthp7pcSuFzBKdcW-v-auOf05OipmDmRdjLi4dCSj-2qXMHRVKV6VNiei7LxZc5gxn4wAc17aHExd2pyXNiAqzp5vb-lIFqPPtXOgd6OUg5Jd16v_vw6A5A</recordid><startdate>20100630</startdate><enddate>20100630</enddate><creator>LEE, Chang-Soo</creator><creator>KIM, Jungwon</creator><creator>GIL HO GU</creator><creator>JO, Du-Hwan</creator><creator>CHAN GYUNG PARK</creator><creator>CHOI, Wonyong</creator><creator>KIM, Hyungjun</creator><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7QQ</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20100630</creationdate><title>Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition</title><author>LEE, Chang-Soo ; KIM, Jungwon ; GIL HO GU ; JO, Du-Hwan ; CHAN GYUNG PARK ; CHOI, Wonyong ; KIM, Hyungjun</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c307t-7824082d842d542edfbb7b1ef7f2c04679f2720c4f590f05c37c7a83316810b23</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Anatase</topic><topic>Catalysis</topic><topic>Catalysts: preparations and properties</topic><topic>Chemistry</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Decomposition</topic><topic>Deposition</topic><topic>Droplets</topic><topic>Exact sciences and technology</topic><topic>Galvanized iron</topic><topic>General and physical chemistry</topic><topic>General, apparatus</topic><topic>Glass</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Photocatalysis</topic><topic>Physics</topic><topic>Surface physical chemistry</topic><topic>Theory and models of film growth</topic><topic>Theory of reactions, general kinetics. Catalysis. Nomenclature, chemical documentation, computer chemistry</topic><topic>Thin films</topic><topic>Titanium dioxide</topic><topic>Vapor phase epitaxy; growth from vapor phase</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>LEE, Chang-Soo</creatorcontrib><creatorcontrib>KIM, Jungwon</creatorcontrib><creatorcontrib>GIL HO GU</creatorcontrib><creatorcontrib>JO, Du-Hwan</creatorcontrib><creatorcontrib>CHAN GYUNG PARK</creatorcontrib><creatorcontrib>CHOI, Wonyong</creatorcontrib><creatorcontrib>KIM, Hyungjun</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Ceramic Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>LEE, Chang-Soo</au><au>KIM, Jungwon</au><au>GIL HO GU</au><au>JO, Du-Hwan</au><au>CHAN GYUNG PARK</au><au>CHOI, Wonyong</au><au>KIM, Hyungjun</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition</atitle><jtitle>Thin solid films</jtitle><date>2010-06-30</date><risdate>2010</risdate><volume>518</volume><issue>17</issue><spage>4757</spage><epage>4761</epage><pages>4757-4761</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><abstract>Titanium dioxide (TiO2) thin films were prepared on Galvanized Iron (GI) substrate by plasma-enhanced atomic layer deposition (PE-ALD) using tetrakis-dimethylamido titanium and O2 plasma to investigate the photocatalytic activities. The PE-ALD TiO2 thin films exhibited relatively high growth rate and the crystal structures of TiO2 thin films depended on the growth temperatures. TiO2 thin films deposited at 200A degree C have amorphous phase, whereas those with anatase phase and bandgap energy about 3.2eV were deposited at growth temperature of 250A degree C and 300A degree C. From contact angles measurement of water droplet, TiO2 thin films with anatase phase and Activ registered glass exhibited superhydrophilic surfaces after UV light exposure. And from photo-induced degradation test of organic solution, anatase TiO2 thin films and Activ registered glass decomposed organic solution under UV illumination. The anatase TiO2 thin film on GI substrate showed higher photocatalytic efficiency than Activ registered glass after 5h UV light exposure. Thus, we suggest that the anatase phase in TiO2 thin film contributes to both superhydrophilicity and photocatalytic decomposition of 4-chlorophenol solution and anatase TiO2 thin films are suitable for self-cleaning applications.</abstract><cop>Amsterdam</cop><pub>Elsevier</pub><doi>10.1016/j.tsf.2010.01.015</doi><tpages>5</tpages></addata></record> |
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| subjects | Anatase Catalysis Catalysts: preparations and properties Chemistry Cross-disciplinary physics: materials science rheology Decomposition Deposition Droplets Exact sciences and technology Galvanized iron General and physical chemistry General, apparatus Glass Materials science Methods of deposition of films and coatings film growth and epitaxy Photocatalysis Physics Surface physical chemistry Theory and models of film growth Theory of reactions, general kinetics. Catalysis. Nomenclature, chemical documentation, computer chemistry Thin films Titanium dioxide Vapor phase epitaxy growth from vapor phase |
| title | Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition |
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