UV-enhanced atomic layer deposition of ZrO2 thin films at room temperature

A UV-enhanced atomic layer deposition (UV-ALD) process was developed to deposit ZrO2 thin films on poly(ethylene terephthalate) (PET) polymer substrates using zirconium tetra-tert-butoxide (ZTB) and H2O as precursors with UV light. In the UV-ALD process, the surface reactions were found to be self-l...

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Veröffentlicht in:	Thin solid films 2010-09, Vol.518 (22), p.6432-6436
Hauptverfasser:	LEE, Byoung H, CHO, Sangho, HWANG, Jae K, KIM, Su H, SUNG, Myung M
Format:	Artikel
Sprache:	eng
Schlagworte:	Adhesive strength Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Deposition Electrical properties Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Electronic transport phenomena in thin films and low-dimensional structures Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics Precursors Surface reactions Thin films Vapor phase epitaxy growth from vapor phase Variability Zirconium Zirconium dioxide
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