Surface modification of doped ZnO thin films

Effects of photo-assisted electrodeless and ion RF-sputter etching on the structural and optical properties of sputtered ZnO:Al thin films were investigated. Photo-assisted electrodeless etching was appropriate for getting “smooth” surfaces and ion RF-sputter etching by high power has significantly...

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Veröffentlicht in:	Applied surface science 2010-07, Vol.256 (18), p.5606-5609
Hauptverfasser:	Flickyngerova, S., Skriniarova, J., Netrvalova, M., Kovac, J., Novotny, I., Sutta, P., Tvarozek, V.
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Diffusion Etching Exact sciences and technology Ii-vi semiconductors Materials science Optical properties Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Optical properties of specific thin films Physics Sputtering Structure and morphology thickness Surface cleaning, etching, patterning Surface roughness Surface treatments Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology Thin films Thin-film solar cell Transmittance Zinc oxide ZnO:Al
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Beschreibung
Zusammenfassung:	Effects of photo-assisted electrodeless and ion RF-sputter etching on the structural and optical properties of sputtered ZnO:Al thin films were investigated. Photo-assisted electrodeless etching was appropriate for getting “smooth” surfaces and ion RF-sputter etching by high power has significantly modified the surface roughness with an increase of the light diffuse transmittance.
ISSN:	0169-4332 1873-5584
DOI:	10.1016/j.apsusc.2010.03.033