Realization of an extremely low reflectance surface based on InP porous nanostructures for application to photoelectrochemical solar cells

Extremely low reflectance was obtained from InP porous nanostructures in UV, visible, and near-infrared ranges. Porous samples were electrochemically prepared on which 130-nm-diameter nanopores were formed in a straight, vertical direction and were laterally separated by 50-nm-thick InP nanowalls. T...

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Veröffentlicht in:Thin solid films 2010-05, Vol.518 (15), p.4399-4402
Hauptverfasser: Sato, Taketomo, Yoshizawa, Naoki, Hashizume, Tamotsu
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Sprache:eng
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