Fabrication of novel double microlens using two step soft lithography
A novel method to fabricate double layer microlens array is proposed where the second smaller microlens are imprinted on the first larger microlens by using soft lithography twice. Key step to implement this method is to imprint micron-size structures on convex surface using nano-imprinting technolo...
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| Veröffentlicht in: | Microelectronic engineering 2010-05, Vol.87 (5), p.1033-1036 |
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| container_title | Microelectronic engineering |
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| creator | Kim, Han-Hyoung O, Beom-Hoan Lee, Seung-Gol Park, Se-Geun |
| description | A novel method to fabricate double layer microlens array is proposed where the second smaller microlens are imprinted on the first larger microlens by using soft lithography twice. Key step to implement this method is to imprint micron-size structures on convex surface using nano-imprinting technology. It is required to prepare thin polydimethylsiloxane (PDMS) mold for the second soft lithography and thus different thickness of PDMS molds have been tested. It is found that 870
μm thick mold is good for fine duplication and durability. We have successfully fabricated the first microlens hemisphere of 51
μm diameter and the second microlens of 3
μm diameter on top of the first. The double microlens array shows more focused light spot when viewed through optical microscope. |
| doi_str_mv | 10.1016/j.mee.2009.11.099 |
| format | Article |
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μm thick mold is good for fine duplication and durability. We have successfully fabricated the first microlens hemisphere of 51
μm diameter and the second microlens of 3
μm diameter on top of the first. The double microlens array shows more focused light spot when viewed through optical microscope.</description><identifier>ISSN: 0167-9317</identifier><identifier>EISSN: 1873-5568</identifier><identifier>DOI: 10.1016/j.mee.2009.11.099</identifier><identifier>CODEN: MIENEF</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Applied sciences ; Arrays ; Brazing. Soldering ; Cross-disciplinary physics: materials science; rheology ; Double microlens ; Electronics ; Exact sciences and technology ; Hemispheres ; Joining, thermal cutting: metallurgical aspects ; Lithography ; Materials science ; Metals. Metallurgy ; Methods of nanofabrication ; Microelectronic fabrication (materials and surfaces technology) ; Molds ; Nanocomposites ; Nanolithography ; Nanomaterials ; Nanoscale pattern formation ; Nanostructure ; Photoresist reflow ; Physics ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Silicone resins ; Two step soft lithography</subject><ispartof>Microelectronic engineering, 2010-05, Vol.87 (5), p.1033-1036</ispartof><rights>2009 Elsevier B.V.</rights><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c359t-3066ef88b9e8008143a284f6afdeb8be64864282923d37fb0918b15f5dd0d2d43</citedby><cites>FETCH-LOGICAL-c359t-3066ef88b9e8008143a284f6afdeb8be64864282923d37fb0918b15f5dd0d2d43</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.mee.2009.11.099$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>309,310,314,780,784,789,790,3550,23930,23931,25140,27924,27925,45995</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=22628741$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Kim, Han-Hyoung</creatorcontrib><creatorcontrib>O, Beom-Hoan</creatorcontrib><creatorcontrib>Lee, Seung-Gol</creatorcontrib><creatorcontrib>Park, Se-Geun</creatorcontrib><title>Fabrication of novel double microlens using two step soft lithography</title><title>Microelectronic engineering</title><description>A novel method to fabricate double layer microlens array is proposed where the second smaller microlens are imprinted on the first larger microlens by using soft lithography twice. Key step to implement this method is to imprint micron-size structures on convex surface using nano-imprinting technology. It is required to prepare thin polydimethylsiloxane (PDMS) mold for the second soft lithography and thus different thickness of PDMS molds have been tested. It is found that 870
μm thick mold is good for fine duplication and durability. We have successfully fabricated the first microlens hemisphere of 51
μm diameter and the second microlens of 3
μm diameter on top of the first. The double microlens array shows more focused light spot when viewed through optical microscope.</description><subject>Applied sciences</subject><subject>Arrays</subject><subject>Brazing. Soldering</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Double microlens</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Hemispheres</subject><subject>Joining, thermal cutting: metallurgical aspects</subject><subject>Lithography</subject><subject>Materials science</subject><subject>Metals. Metallurgy</subject><subject>Methods of nanofabrication</subject><subject>Microelectronic fabrication (materials and surfaces technology)</subject><subject>Molds</subject><subject>Nanocomposites</subject><subject>Nanolithography</subject><subject>Nanomaterials</subject><subject>Nanoscale pattern formation</subject><subject>Nanostructure</subject><subject>Photoresist reflow</subject><subject>Physics</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Silicone resins</subject><subject>Two step soft lithography</subject><issn>0167-9317</issn><issn>1873-5568</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNp9kE1LAzEQhoMoWD9-gLdcxNOu-djNZvEkpVWh4EXPIZtM2pTtpibbSv-9KRWPnoaB532HeRC6o6SkhIrHdbkBKBkhbUlpSdr2DE2obHhR10Keo0lmmqLltLlEVymtSd4rIidoNtdd9EaPPgw4ODyEPfTYhl3XA954E0MPQ8K75IclHr8DTiNscQpuxL0fV2EZ9XZ1uEEXTvcJbn_nNfqczz6mr8Xi_eVt-rwoDK_bseBECHBSdi1IQiStuGayckI7C53sQFRSVEyylnHLG9eRlsqO1q62llhmK36NHk692xi-dpBGtfHJQN_rAcIuqabmDZdC8EzSE5k_SCmCU9voNzoeFCXqaEytVTamjsYUpSoby5n733adjO5d1IPx6S_ImGCyqWjmnk4c5Ff3HqJKxsNgwPoIZlQ2-H-u_ADccYCd</recordid><startdate>20100501</startdate><enddate>20100501</enddate><creator>Kim, Han-Hyoung</creator><creator>O, Beom-Hoan</creator><creator>Lee, Seung-Gol</creator><creator>Park, Se-Geun</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20100501</creationdate><title>Fabrication of novel double microlens using two step soft lithography</title><author>Kim, Han-Hyoung ; O, Beom-Hoan ; Lee, Seung-Gol ; Park, Se-Geun</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c359t-3066ef88b9e8008143a284f6afdeb8be64864282923d37fb0918b15f5dd0d2d43</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Applied sciences</topic><topic>Arrays</topic><topic>Brazing. Soldering</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Double microlens</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Hemispheres</topic><topic>Joining, thermal cutting: metallurgical aspects</topic><topic>Lithography</topic><topic>Materials science</topic><topic>Metals. Metallurgy</topic><topic>Methods of nanofabrication</topic><topic>Microelectronic fabrication (materials and surfaces technology)</topic><topic>Molds</topic><topic>Nanocomposites</topic><topic>Nanolithography</topic><topic>Nanomaterials</topic><topic>Nanoscale pattern formation</topic><topic>Nanostructure</topic><topic>Photoresist reflow</topic><topic>Physics</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Silicone resins</topic><topic>Two step soft lithography</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kim, Han-Hyoung</creatorcontrib><creatorcontrib>O, Beom-Hoan</creatorcontrib><creatorcontrib>Lee, Seung-Gol</creatorcontrib><creatorcontrib>Park, Se-Geun</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Microelectronic engineering</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kim, Han-Hyoung</au><au>O, Beom-Hoan</au><au>Lee, Seung-Gol</au><au>Park, Se-Geun</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Fabrication of novel double microlens using two step soft lithography</atitle><jtitle>Microelectronic engineering</jtitle><date>2010-05-01</date><risdate>2010</risdate><volume>87</volume><issue>5</issue><spage>1033</spage><epage>1036</epage><pages>1033-1036</pages><issn>0167-9317</issn><eissn>1873-5568</eissn><coden>MIENEF</coden><abstract>A novel method to fabricate double layer microlens array is proposed where the second smaller microlens are imprinted on the first larger microlens by using soft lithography twice. Key step to implement this method is to imprint micron-size structures on convex surface using nano-imprinting technology. It is required to prepare thin polydimethylsiloxane (PDMS) mold for the second soft lithography and thus different thickness of PDMS molds have been tested. It is found that 870
μm thick mold is good for fine duplication and durability. We have successfully fabricated the first microlens hemisphere of 51
μm diameter and the second microlens of 3
μm diameter on top of the first. The double microlens array shows more focused light spot when viewed through optical microscope.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.mee.2009.11.099</doi><tpages>4</tpages></addata></record> |
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| subjects | Applied sciences Arrays Brazing. Soldering Cross-disciplinary physics: materials science rheology Double microlens Electronics Exact sciences and technology Hemispheres Joining, thermal cutting: metallurgical aspects Lithography Materials science Metals. Metallurgy Methods of nanofabrication Microelectronic fabrication (materials and surfaces technology) Molds Nanocomposites Nanolithography Nanomaterials Nanoscale pattern formation Nanostructure Photoresist reflow Physics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Silicone resins Two step soft lithography |
| title | Fabrication of novel double microlens using two step soft lithography |
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