Charged Particle Nanopatterning (CHARPAN) of 2D and 3D masters for flexible replication in Substrate Conformal Imprint Lithography (SCIL)

Recently, the first generation programmable Aperture Plate System with integrated CMOS electronics (CMOS-APS) featuring 43 thousand switchable beams has been inserted into a Charged Particle Nanopatterning (CHARPAN) tool. Using this configuration, the first (2D) exposure results in Hydrogen Silsesqu...

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Veröffentlicht in:	Microelectronic engineering 2010-05, Vol.87 (5), p.1062-1065
Hauptverfasser:	van Delft, Falco, van de Laar, Robert, Verschuuren, Marc, Platzgummer, Elmar, Loeschner, Hans
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Charged particles CHARPAN, Charged Particle Nanopatterning Cross-disciplinary physics: materials science rheology Design. Technologies. Operation analysis. Testing Electronics Exact sciences and technology HSQ, Hydrogen Silsesquioxane Integrated circuits Materials science Methods of nanofabrication Microelectronic fabrication (materials and surfaces technology) Nanocomposites Nanomaterials Nanoscale pattern formation Nanostructure Physics SCIL, Substrate Conformal Imprint Lithography Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Silicone resins Surface treatments Three dimensional Two dimensional
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