Microstructure and Properties of TiAlN/AlN Composite Film Deposited on Cam’s Profile by Ion Beam Sputtering Technique

The study reports a new surface formation technology during manufacturing process of parallel indexing cam mechanism, ion beam sputtering deposition, in which the operation temperature can be controlled below the limitation of phases exchanging or at room temperature. Phase exchanging deformation ca...

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Veröffentlicht in:Key engineering materials 2010-01, Vol.443, p.465-468
Hauptverfasser: Guo, Pei Quan, Wang, Shou Ren, Cui, Huan Yong
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description The study reports a new surface formation technology during manufacturing process of parallel indexing cam mechanism, ion beam sputtering deposition, in which the operation temperature can be controlled below the limitation of phases exchanging or at room temperature. Phase exchanging deformation can be avoided and the shape accuracy and dimension accuracy can be improved compared with surface quenching process. The microstructure and properties of TiAlN/AlN composite film deposited on the profile surface of cam (made of 45 steel) by ion beam sputtering deposition were discussed. X-ray diffraction (XRD), scanning electron microscopy (SEM) and transmission electron microscope (TEM) analysis has been used to characterize film’s microstructure and properties. The micro-hardness and adherence grade were tested.
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subjects Adhesion
Aluminum nitride
Controlled atmospheres
Deformation
Deposition
Diffraction
Exchanging
Indexing
Ion beam sputtering
Medium carbon steels
Microhardness
Microstructure
Phases
Quenching
Scanning electron microscopy
Slopes
Steels
Transmission electron microscopy
X-rays
title Microstructure and Properties of TiAlN/AlN Composite Film Deposited on Cam’s Profile by Ion Beam Sputtering Technique
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