Surface analysis of CVD diamond exposed to fusion plasma

Microcrystalline undoped and heavily boron-doped polycrystalline diamond layers have been deposited on various substrates by hot filament CVD and exposed to hydrogen plasma in a linear plasma reactor (Pilot-PSI, The Netherlands) that simulates the high flux and high density plasma conditions of toka...

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Veröffentlicht in:	Diamond and related materials 2010-07, Vol.19 (7), p.818-823
Hauptverfasser:	Porro, S., De Temmerman, G., MacLaren, D.A., Lisgo, S., Rudakov, D.L., Westerhout, J., Wiora, M., John, P., Villalpando, I., Wilson, J.I.B.
Format:	Artikel
Sprache:	eng
Schlagworte:	Amorphisation Chemical vapor deposition Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology CVD diamond coatings Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Erosion Exact sciences and technology Exposure Failure Filaments Fullerenes and related materials diamonds, graphite High density Hydrogen plasma Materials science Methods of deposition of films and coatings film growth and epitaxy Nuclear fusion Physics Plasma facing material Specific materials Structure and morphology thickness Surface and interface electron states Surface erosion Surface states, band structure, electron density of states Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology Tokamak devices
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