Diffusion at anodically bonded interfaces
The diffusion of gas molecules into cavities closed by anodic bonding is quantified by the annealing of specially designed test structures. Annealing is performed at temperatures in the range 150-430 deg C for several days. An increased concentration of molecules within the closed cavities after hea...
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Veröffentlicht in: | Journal of micromechanics and microengineering 2001-07, Vol.11 (4), p.376-381 |
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container_title | Journal of micromechanics and microengineering |
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creator | Visser, M M Moe, S T Hanneborg, A B |
description | The diffusion of gas molecules into cavities closed by anodic bonding is quantified by the annealing of specially designed test structures. Annealing is performed at temperatures in the range 150-430 deg C for several days. An increased concentration of molecules within the closed cavities after heat treatments is verified both electrically and optically. The diffusion of gas into the cavities is found to be substantial at temperatures above 300 deg C. A diffusion parameter, the diffusion coefficient times the height of the bonded interface, is found from curve fitting of experimental data with an analytic expression for diffusion. |
doi_str_mv | 10.1088/0960-1317/11/4/316 |
format | Article |
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A diffusion parameter, the diffusion coefficient times the height of the bonded interface, is found from curve fitting of experimental data with an analytic expression for diffusion.</description><identifier>ISSN: 0960-1317</identifier><identifier>EISSN: 1361-6439</identifier><identifier>DOI: 10.1088/0960-1317/11/4/316</identifier><language>eng</language><publisher>IOP Publishing</publisher><subject>Annealing ; Bonding ; Curve fitting ; Differential equations ; Etching ; High temperature effects ; Interfaces (materials)</subject><ispartof>Journal of micromechanics and microengineering, 2001-07, Vol.11 (4), p.376-381</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c380t-dc2da02ffa53e281e89a73b9593f5c780897197eb94e3bb77770a74d2280fe7b3</citedby><cites>FETCH-LOGICAL-c380t-dc2da02ffa53e281e89a73b9593f5c780897197eb94e3bb77770a74d2280fe7b3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.1088/0960-1317/11/4/316/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,780,784,27924,27925,53830,53910</link.rule.ids></links><search><creatorcontrib>Visser, M M</creatorcontrib><creatorcontrib>Moe, S T</creatorcontrib><creatorcontrib>Hanneborg, A B</creatorcontrib><title>Diffusion at anodically bonded interfaces</title><title>Journal of micromechanics and microengineering</title><description>The diffusion of gas molecules into cavities closed by anodic bonding is quantified by the annealing of specially designed test structures. Annealing is performed at temperatures in the range 150-430 deg C for several days. An increased concentration of molecules within the closed cavities after heat treatments is verified both electrically and optically. The diffusion of gas into the cavities is found to be substantial at temperatures above 300 deg C. A diffusion parameter, the diffusion coefficient times the height of the bonded interface, is found from curve fitting of experimental data with an analytic expression for diffusion.</description><subject>Annealing</subject><subject>Bonding</subject><subject>Curve fitting</subject><subject>Differential equations</subject><subject>Etching</subject><subject>High temperature effects</subject><subject>Interfaces (materials)</subject><issn>0960-1317</issn><issn>1361-6439</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2001</creationdate><recordtype>article</recordtype><recordid>eNp90DtPwzAUBWALgUQp_AGmTKAOIffaiR8jKuUhVWKB2XIcWzJK4xCnQ_89qYq6VOpd7vKdMxxC7hGeEKQsQHHIkaEoEIuyYMgvyAwZx5yXTF2S2RFck5uUfgAQJcoZWbwE77cpxC4zY2a62ARr2naX1bFrXJOFbnSDN9alW3LlTZvc3f-fk-_X1dfyPV9_vn0sn9e5ZRLGvLG0MUC9NxVzVKKTyghWq0oxX1khQSqBSrhalY7VtZgOjCgbSiV4J2o2J4-H3n6Iv1uXRr0Jybq2NZ2L26RFyRkyBdUkH85KyisKgtMJ0gO0Q0xpcF73Q9iYYacR9H4_vZ9H7-fRiLrU035TaHEIhdgf_anTfeMnm5_aM91_Uah7hQ</recordid><startdate>20010701</startdate><enddate>20010701</enddate><creator>Visser, M M</creator><creator>Moe, S T</creator><creator>Hanneborg, A B</creator><general>IOP Publishing</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7TB</scope><scope>8FD</scope><scope>FR3</scope><scope>7TC</scope></search><sort><creationdate>20010701</creationdate><title>Diffusion at anodically bonded interfaces</title><author>Visser, M M ; Moe, S T ; Hanneborg, A B</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c380t-dc2da02ffa53e281e89a73b9593f5c780897197eb94e3bb77770a74d2280fe7b3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2001</creationdate><topic>Annealing</topic><topic>Bonding</topic><topic>Curve fitting</topic><topic>Differential equations</topic><topic>Etching</topic><topic>High temperature effects</topic><topic>Interfaces (materials)</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Visser, M M</creatorcontrib><creatorcontrib>Moe, S T</creatorcontrib><creatorcontrib>Hanneborg, A B</creatorcontrib><collection>CrossRef</collection><collection>Mechanical & Transportation Engineering Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>Mechanical Engineering Abstracts</collection><jtitle>Journal of micromechanics and microengineering</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Visser, M M</au><au>Moe, S T</au><au>Hanneborg, A B</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Diffusion at anodically bonded interfaces</atitle><jtitle>Journal of micromechanics and microengineering</jtitle><date>2001-07-01</date><risdate>2001</risdate><volume>11</volume><issue>4</issue><spage>376</spage><epage>381</epage><pages>376-381</pages><issn>0960-1317</issn><eissn>1361-6439</eissn><abstract>The diffusion of gas molecules into cavities closed by anodic bonding is quantified by the annealing of specially designed test structures. Annealing is performed at temperatures in the range 150-430 deg C for several days. An increased concentration of molecules within the closed cavities after heat treatments is verified both electrically and optically. The diffusion of gas into the cavities is found to be substantial at temperatures above 300 deg C. A diffusion parameter, the diffusion coefficient times the height of the bonded interface, is found from curve fitting of experimental data with an analytic expression for diffusion.</abstract><pub>IOP Publishing</pub><doi>10.1088/0960-1317/11/4/316</doi><tpages>6</tpages></addata></record> |
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subjects | Annealing Bonding Curve fitting Differential equations Etching High temperature effects Interfaces (materials) |
title | Diffusion at anodically bonded interfaces |
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