Growth and characterization of poly(arylamine) thin films prepared by vapor deposition

Thin films of new organic redox-active arylamine dendrimers have been examined. The thermal properties of the bulk samples have been measured by differential scanning calorimetry and thermogravimetric analysis. In general, these compounds exhibit amorphous phases with glass transition temperatures n...

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Veröffentlicht in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films Surfaces, and Films, 2000-07, Vol.18 (4), p.1875-1880
Hauptverfasser: Szulczewski, G. J., Selby, T. D., Kim, K.-Y., Hassenzahl, J. D., Blackstock, S. C.
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container_end_page 1880
container_issue 4
container_start_page 1875
container_title Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
container_volume 18
creator Szulczewski, G. J.
Selby, T. D.
Kim, K.-Y.
Hassenzahl, J. D.
Blackstock, S. C.
description Thin films of new organic redox-active arylamine dendrimers have been examined. The thermal properties of the bulk samples have been measured by differential scanning calorimetry and thermogravimetric analysis. In general, these compounds exhibit amorphous phases with glass transition temperatures near 100 °C and are thermally stable up to 400 °C. Thin films (1–100 nm) of these large (1300–2200 amu) molecules were prepared by vapor deposition onto Au and Si(100) surfaces. Nuclear magnetic resonance analysis of redissolved films proved that vapor deposition occurs without molecular decomposition. Ex situ surface characterization was performed by reflection–absorption infrared spectroscopy, x-ray photoelectron spectroscopy, spectroscopic ellipsometry, and atomic-force microscopy to document the chemical integrity and morphology of the films. The analyses show that the vapor deposition produces molecularly smooth dendrimer films at high surface coverages, while at low surface coverage, film growth and morphology depend greatly on the chemical nature of the surface.
doi_str_mv 10.1116/1.582439
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Ex situ surface characterization was performed by reflection–absorption infrared spectroscopy, x-ray photoelectron spectroscopy, spectroscopic ellipsometry, and atomic-force microscopy to document the chemical integrity and morphology of the films. 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Nuclear magnetic resonance analysis of redissolved films proved that vapor deposition occurs without molecular decomposition. Ex situ surface characterization was performed by reflection–absorption infrared spectroscopy, x-ray photoelectron spectroscopy, spectroscopic ellipsometry, and atomic-force microscopy to document the chemical integrity and morphology of the films. 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The thermal properties of the bulk samples have been measured by differential scanning calorimetry and thermogravimetric analysis. In general, these compounds exhibit amorphous phases with glass transition temperatures near 100 °C and are thermally stable up to 400 °C. Thin films (1–100 nm) of these large (1300–2200 amu) molecules were prepared by vapor deposition onto Au and Si(100) surfaces. Nuclear magnetic resonance analysis of redissolved films proved that vapor deposition occurs without molecular decomposition. Ex situ surface characterization was performed by reflection–absorption infrared spectroscopy, x-ray photoelectron spectroscopy, spectroscopic ellipsometry, and atomic-force microscopy to document the chemical integrity and morphology of the films. 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1520-8559
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subjects Aromatic polymers
Differential scanning calorimetry
Electrochemistry
Film growth
Gold
Morphology
Semiconducting silicon
Thermogravimetric analysis
Thin films
Vapor deposition
title Growth and characterization of poly(arylamine) thin films prepared by vapor deposition
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