Evolution of Block Copolymer Lithography to Highly Ordered Square Arrays

The manufacture of smaller, faster, more efficient microelectronic components is a major scientific and technological challenge, driven in part by a constant need for smaller lithographically defined features and patterns. Traditional self-assembling approaches based on block copolymer lithography s...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Science (American Association for the Advancement of Science) 2008-10, Vol.322 (5900), p.429-432
Hauptverfasser:	Tang, Chuanbing, Lennon, Erin M, Fredrickson, Glenn H, Kramer, Edward J, Hawker, Craig J
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Block copolymers Copolymers Cylinders Electronics Exact sciences and technology Forms of application and semi-finished materials Hydrogen bonds Integrated circuits Lithography Macromolecules Material films Materials science Miscellaneous Molecular weight Nanotechnology Polymer industry, paints, wood Polymers Semiconductors Technology of polymers
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!