Enhanced TEM Sample Preparation Using In-situ Low Energy Argon Ion Milling

Enhanced TEM Sample Preparation Using In-situ Low Energy Argon Ion Milling

Sample preparation is a critical step in transmission electron microscopy (TEM) that significantly determines the quality of structural characterization and analysis of a specimen. In recent years, the accuracy and quality requirements for the preparation of TEM cross-sections of nanoelectronic stru...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Stegmann, Heiko, Ritz, Yvonne, Utess, Dirk, Hiibner, Rene, Zschech, Ehrenfried
Format: Tagungsbericht
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 279
container_issue
container_start_page 275
container_title
container_volume 1173
creator Stegmann, Heiko
Ritz, Yvonne
Utess, Dirk
Hiibner, Rene
Zschech, Ehrenfried
description Sample preparation is a critical step in transmission electron microscopy (TEM) that significantly determines the quality of structural characterization and analysis of a specimen. In recent years, the accuracy and quality requirements for the preparation of TEM cross-sections of nanoelectronic structures have drastically increased Combining a focused low-energy noble gas ion beam column with a FIB and a SEM column in a three beam system meets these requirements. It provides precise target preparation as well as minimum thickness and surface damage of the TEM sample.
doi_str_mv 10.1063/1.3251233
format Conference Proceeding
fullrecord <record><control><sourceid>proquest</sourceid><recordid>TN_cdi_proquest_miscellaneous_743326394</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>743326394</sourcerecordid><originalsourceid>FETCH-LOGICAL-p222t-e84c649b7b5663837e5d146be6f0f1ba63fffe13c9899f210f52b61987dc7e693</originalsourceid><addsrcrecordid>eNotjEFLwzAYhgMquE0P_oPcPHUm-dKkOY5RXaVDwQ28jbT9UitdWpsW8d9b0MPLc3geXkLuOFtzpuCBr0HEXABckCXTEEumuVCXZMGYkZGQ8H5NliF8MiaM1smCPKf-w_oSK3pI9_TNnvsW6euAvR3s2HSeHkPja5r5KDTjRPPum6Yeh_qHboZ61tm8fdO2c3RDrpxtA97-c0WOj-lhu4vyl6dsu8mjXggxRpjIUklT6CJWChLQGFdcqgKVY44XVoFzDjmUJjHGCc5cLArFTaKrUqMysCL3f7_90H1NGMbTuQkltq312E3hpCWAUGAk_AJiHE4e</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype><pqid>743326394</pqid></control><display><type>conference_proceeding</type><title>Enhanced TEM Sample Preparation Using In-situ Low Energy Argon Ion Milling</title><source>AIP Journals Complete</source><creator>Stegmann, Heiko ; Ritz, Yvonne ; Utess, Dirk ; Hiibner, Rene ; Zschech, Ehrenfried</creator><creatorcontrib>Stegmann, Heiko ; Ritz, Yvonne ; Utess, Dirk ; Hiibner, Rene ; Zschech, Ehrenfried</creatorcontrib><description>Sample preparation is a critical step in transmission electron microscopy (TEM) that significantly determines the quality of structural characterization and analysis of a specimen. In recent years, the accuracy and quality requirements for the preparation of TEM cross-sections of nanoelectronic structures have drastically increased Combining a focused low-energy noble gas ion beam column with a FIB and a SEM column in a three beam system meets these requirements. It provides precise target preparation as well as minimum thickness and surface damage of the TEM sample.</description><identifier>ISSN: 0094-243X</identifier><identifier>ISBN: 0735407126</identifier><identifier>ISBN: 9780735407121</identifier><identifier>DOI: 10.1063/1.3251233</identifier><language>eng</language><ispartof>2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics, 2009, Vol.1173, p.275-279</ispartof><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Stegmann, Heiko</creatorcontrib><creatorcontrib>Ritz, Yvonne</creatorcontrib><creatorcontrib>Utess, Dirk</creatorcontrib><creatorcontrib>Hiibner, Rene</creatorcontrib><creatorcontrib>Zschech, Ehrenfried</creatorcontrib><title>Enhanced TEM Sample Preparation Using In-situ Low Energy Argon Ion Milling</title><title>2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics</title><description>Sample preparation is a critical step in transmission electron microscopy (TEM) that significantly determines the quality of structural characterization and analysis of a specimen. In recent years, the accuracy and quality requirements for the preparation of TEM cross-sections of nanoelectronic structures have drastically increased Combining a focused low-energy noble gas ion beam column with a FIB and a SEM column in a three beam system meets these requirements. It provides precise target preparation as well as minimum thickness and surface damage of the TEM sample.</description><issn>0094-243X</issn><isbn>0735407126</isbn><isbn>9780735407121</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2009</creationdate><recordtype>conference_proceeding</recordtype><recordid>eNotjEFLwzAYhgMquE0P_oPcPHUm-dKkOY5RXaVDwQ28jbT9UitdWpsW8d9b0MPLc3geXkLuOFtzpuCBr0HEXABckCXTEEumuVCXZMGYkZGQ8H5NliF8MiaM1smCPKf-w_oSK3pI9_TNnvsW6euAvR3s2HSeHkPja5r5KDTjRPPum6Yeh_qHboZ61tm8fdO2c3RDrpxtA97-c0WOj-lhu4vyl6dsu8mjXggxRpjIUklT6CJWChLQGFdcqgKVY44XVoFzDjmUJjHGCc5cLArFTaKrUqMysCL3f7_90H1NGMbTuQkltq312E3hpCWAUGAk_AJiHE4e</recordid><startdate>20090101</startdate><enddate>20090101</enddate><creator>Stegmann, Heiko</creator><creator>Ritz, Yvonne</creator><creator>Utess, Dirk</creator><creator>Hiibner, Rene</creator><creator>Zschech, Ehrenfried</creator><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20090101</creationdate><title>Enhanced TEM Sample Preparation Using In-situ Low Energy Argon Ion Milling</title><author>Stegmann, Heiko ; Ritz, Yvonne ; Utess, Dirk ; Hiibner, Rene ; Zschech, Ehrenfried</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-p222t-e84c649b7b5663837e5d146be6f0f1ba63fffe13c9899f210f52b61987dc7e693</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2009</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Stegmann, Heiko</creatorcontrib><creatorcontrib>Ritz, Yvonne</creatorcontrib><creatorcontrib>Utess, Dirk</creatorcontrib><creatorcontrib>Hiibner, Rene</creatorcontrib><creatorcontrib>Zschech, Ehrenfried</creatorcontrib><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Stegmann, Heiko</au><au>Ritz, Yvonne</au><au>Utess, Dirk</au><au>Hiibner, Rene</au><au>Zschech, Ehrenfried</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Enhanced TEM Sample Preparation Using In-situ Low Energy Argon Ion Milling</atitle><btitle>2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics</btitle><date>2009-01-01</date><risdate>2009</risdate><volume>1173</volume><spage>275</spage><epage>279</epage><pages>275-279</pages><issn>0094-243X</issn><isbn>0735407126</isbn><isbn>9780735407121</isbn><abstract>Sample preparation is a critical step in transmission electron microscopy (TEM) that significantly determines the quality of structural characterization and analysis of a specimen. In recent years, the accuracy and quality requirements for the preparation of TEM cross-sections of nanoelectronic structures have drastically increased Combining a focused low-energy noble gas ion beam column with a FIB and a SEM column in a three beam system meets these requirements. It provides precise target preparation as well as minimum thickness and surface damage of the TEM sample.</abstract><doi>10.1063/1.3251233</doi><tpages>5</tpages><oa>free_for_read</oa></addata></record>
fulltext fulltext
identifier ISSN: 0094-243X
ispartof 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics, 2009, Vol.1173, p.275-279
issn 0094-243X
language eng
recordid cdi_proquest_miscellaneous_743326394
source AIP Journals Complete
title Enhanced TEM Sample Preparation Using In-situ Low Energy Argon Ion Milling
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-29T11%3A11%3A35IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Enhanced%20TEM%20Sample%20Preparation%20Using%20In-situ%20Low%20Energy%20Argon%20Ion%20Milling&rft.btitle=2009%20International%20Conference%20on%20Frontiers%20of%20Characterization%20and%20Metrology%20for%20Nanoelectronics&rft.au=Stegmann,%20Heiko&rft.date=2009-01-01&rft.volume=1173&rft.spage=275&rft.epage=279&rft.pages=275-279&rft.issn=0094-243X&rft.isbn=0735407126&rft.isbn_list=9780735407121&rft_id=info:doi/10.1063/1.3251233&rft_dat=%3Cproquest%3E743326394%3C/proquest%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=743326394&rft_id=info:pmid/&rfr_iscdi=true