Photosensitivity of lead germanate glass waveguides grown by pulsed laser deposition
We report very large photoinduced refractive-index changes Dn, of the order of ~10(2), in lead germanate glass waveguides grown by pulsed-laser deposition. The magnitude of Dn was derived from measurements of diffraction efficiency for gratings written by exposure to 244-nm light through a phase mas...
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Veröffentlicht in: | Optics letters 1998-11, Vol.23 (22), p.1751-1753 |
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creator | Mailis, S Anderson, A A Barrington, S J Brocklesby, W S Greef, R Rutt, H N Eason, R W Vainos, N A Grivas, C |
description | We report very large photoinduced refractive-index changes Dn, of the order of ~10(2), in lead germanate glass waveguides grown by pulsed-laser deposition. The magnitude of Dn was derived from measurements of diffraction efficiency for gratings written by exposure to 244-nm light through a phase mask, whereas the sign of Dn was determined from ellipsometric data. Results are shown for films grown under oxygen pressures ranging from 1 chi 10(-2) to 6 chi 10(-2)mbars (1.33mbars=1 Torr). |
doi_str_mv | 10.1364/OL.23.001751 |
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title | Photosensitivity of lead germanate glass waveguides grown by pulsed laser deposition |
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