Investigation of a half-wave method for birefringence or thickness measurements of a thick, semitransparent, uniaxial, anisotropic substrate by use of spectroscopic ellipsometry

A half-wave method of measurement of wafer birefringence that is based on interference fringes recorded from a uniaxial wafer by use of a standard phase-modulated spectroscopic ellipsometer is investigated. The birefringence of uniaxial wafers is calculated from the extremal points in the recorded o...

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Veröffentlicht in:	Applied Optics 2000-09, Vol.39 (25), p.4649-4657
Hauptverfasser:	Kildemo, M, Mooney, M, Sudre, C, Kelly, P V
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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