Mo/Y multilayer mirrors for the 8-12-nm wavelength region

Mo/Y multilayer mirrors for the 8-12-nm wavelength region

Mo/Y multilayer mirrors were deposited by dc magnetron sputtering under different deposition conditions. They were characterized by reflectance measurements at normal and grazing angles of incidence, by transmission electron microscopy, and by Auger depth profiling. Normal-incidence peak reflectance...

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Veröffentlicht in:Optics letters 1994-07, Vol.19 (13), p.1004-1006
Hauptverfasser: Montcalm, C, Sullivan, B T, Ranger, M, Slaughter, J M, Kearney, P A, Falco, C M, Chaker, M
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container_end_page 1006
container_issue 13
container_start_page 1004
container_title Optics letters
container_volume 19
creator Montcalm, C
Sullivan, B T
Ranger, M
Slaughter, J M
Kearney, P A
Falco, C M
Chaker, M
description Mo/Y multilayer mirrors were deposited by dc magnetron sputtering under different deposition conditions. They were characterized by reflectance measurements at normal and grazing angles of incidence, by transmission electron microscopy, and by Auger depth profiling. Normal-incidence peak reflectances of 34% and 22% were measured at wavelengths of 11.5 and 8.1 nm, respectively. Interface roughness and contamination of the layers during deposition limit the peak reflectance of these Mo/Y mirrors.
doi_str_mv 10.1364/OL.19.001004
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title Mo/Y multilayer mirrors for the 8-12-nm wavelength region
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