Embossing technique for fabricating integrated optical components in hard inorganic waveguiding materials

We describe a novel embossing technique for fabricating integrated optical components in hard and resistant inorganic waveguiding materials of good optical quality. The desired structure is embossed into a dip-coated deformable gel film prepared from organometallic solutions. Subsequent heat treatme...

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Veröffentlicht in:Optics letters 1983-10, Vol.8 (10), p.537-539
Hauptverfasser: LUKOSZ, W, TIEFENTHALER, K
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description We describe a novel embossing technique for fabricating integrated optical components in hard and resistant inorganic waveguiding materials of good optical quality. The desired structure is embossed into a dip-coated deformable gel film prepared from organometallic solutions. Subsequent heat treatment transforms it into inorganic hard oxide material. We have successfully fabricated surface-relief gratings with 1200 lines/mm on SiO(2)-TiO(2) waveguides (with refractive index n(F) approximately 1.8, thickness d(F) approximately 120 nm, and loss
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subjects All optical circuits
Applied sciences
Circuit properties
Electric, optical and optoelectronic circuits
Electronics
Exact sciences and technology
Optical and optoelectronic circuits
title Embossing technique for fabricating integrated optical components in hard inorganic waveguiding materials
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