Photoelectrocatalytic properties of nitrogen doped TiO2/Ti photoelectrode prepared by plasma based ion implantation under visible light
Nitrogen doped TiO(2)/Ti photoelectrodes were prepared by a sequence of anodization and plasma based ion implantation (PBII). The properties of this photoelectrode were characterized by scanning electronic microscopy (SEM), atomic force microscopy (AFM), X-ray diffraction (XRD), X-ray photoelectron...
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Veröffentlicht in: | Journal of hazardous materials 2010-03, Vol.175 (1-3), p.524-531 |
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