Nanophotonic devices on thin buried oxide Silicon-On-Insulator substrates
We demonstrate a silicon photonic platform using thin buried oxide silicon-on-insulator (SOI) substrates using localized substrate removal. We show high confinement silicon strip waveguides, micro-ring resonators and nanotapers using this technology. Propagation losses for the waveguides using the c...
Gespeichert in:
| Veröffentlicht in: | Optics express 2010-02, Vol.18 (4), p.3850-3857 |
|---|---|
| Hauptverfasser: | , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 3857 |
|---|---|
| container_issue | 4 |
| container_start_page | 3850 |
| container_title | Optics express |
| container_volume | 18 |
| creator | Sridaran, Suresh Bhave, Sunil A |
| description | We demonstrate a silicon photonic platform using thin buried oxide silicon-on-insulator (SOI) substrates using localized substrate removal. We show high confinement silicon strip waveguides, micro-ring resonators and nanotapers using this technology. Propagation losses for the waveguides using the cutback method are 3.88 dB/cm for the quasi-TE mode and 5.06 dB/cm for the quasi-TM mode. Ring resonators with a loaded quality factor (Q) of 46,500 for the quasi-TM mode and intrinsic Q of 148,000 for the quasi-TE mode have been obtained. This process will enable the integration of photonic structures with thin buried oxide SOI based electronics. |
| doi_str_mv | 10.1364/OE.18.003850 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_733883618</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>733883618</sourcerecordid><originalsourceid>FETCH-LOGICAL-c328t-5705bfb2c2111467fbbaf8197d57f304a686350c290f7e76cae2ecd08c289a1f3</originalsourceid><addsrcrecordid>eNpN0D1PwzAUhWELgWgpbMzIGwsp_khiZ0RVgUgVGYDZsh1bNUrtYjsI_j1FLYjp3uHRGV4ALjGaY1qXt91yjvkcIcordASmGDVlUSLOjv_9E3CW0htCuGQNOwUTstMNbaopaJ-kD9t1yME7DXvz4bRJMHiY185DNUZnehg-XW_gsxucDr7ofNH6NA4yhwjTqFKOMpt0Dk6sHJK5ONwZeL1fviwei1X30C7uVoWmhOeiYqhSVhFNMMZlzaxS0nLcsL5ilqJS1rymFdKkQZYZVmtpiNE94prwRmJLZ-B6v7uN4X00KYuNS9oMg_QmjEkwSjmnNeY7ebOXOoaUorFiG91Gxi-BkfhpJ7qlwFzs2-341WF4VBvT_-HfWPQbJAppnw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>733883618</pqid></control><display><type>article</type><title>Nanophotonic devices on thin buried oxide Silicon-On-Insulator substrates</title><source>MEDLINE</source><source>DOAJ Directory of Open Access Journals</source><source>EZB-FREE-00999 freely available EZB journals</source><source>Alma/SFX Local Collection</source><creator>Sridaran, Suresh ; Bhave, Sunil A</creator><creatorcontrib>Sridaran, Suresh ; Bhave, Sunil A</creatorcontrib><description>We demonstrate a silicon photonic platform using thin buried oxide silicon-on-insulator (SOI) substrates using localized substrate removal. We show high confinement silicon strip waveguides, micro-ring resonators and nanotapers using this technology. Propagation losses for the waveguides using the cutback method are 3.88 dB/cm for the quasi-TE mode and 5.06 dB/cm for the quasi-TM mode. Ring resonators with a loaded quality factor (Q) of 46,500 for the quasi-TM mode and intrinsic Q of 148,000 for the quasi-TE mode have been obtained. This process will enable the integration of photonic structures with thin buried oxide SOI based electronics.</description><identifier>ISSN: 1094-4087</identifier><identifier>EISSN: 1094-4087</identifier><identifier>DOI: 10.1364/OE.18.003850</identifier><identifier>PMID: 20389395</identifier><language>eng</language><publisher>United States</publisher><subject>Electric Conductivity ; Equipment Design ; Equipment Failure Analysis ; Nanotechnology - instrumentation ; Oxides - chemistry ; Photometry - instrumentation ; Photons ; Silicon - chemistry</subject><ispartof>Optics express, 2010-02, Vol.18 (4), p.3850-3857</ispartof><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c328t-5705bfb2c2111467fbbaf8197d57f304a686350c290f7e76cae2ecd08c289a1f3</citedby><cites>FETCH-LOGICAL-c328t-5705bfb2c2111467fbbaf8197d57f304a686350c290f7e76cae2ecd08c289a1f3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,864,27923,27924</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/20389395$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Sridaran, Suresh</creatorcontrib><creatorcontrib>Bhave, Sunil A</creatorcontrib><title>Nanophotonic devices on thin buried oxide Silicon-On-Insulator substrates</title><title>Optics express</title><addtitle>Opt Express</addtitle><description>We demonstrate a silicon photonic platform using thin buried oxide silicon-on-insulator (SOI) substrates using localized substrate removal. We show high confinement silicon strip waveguides, micro-ring resonators and nanotapers using this technology. Propagation losses for the waveguides using the cutback method are 3.88 dB/cm for the quasi-TE mode and 5.06 dB/cm for the quasi-TM mode. Ring resonators with a loaded quality factor (Q) of 46,500 for the quasi-TM mode and intrinsic Q of 148,000 for the quasi-TE mode have been obtained. This process will enable the integration of photonic structures with thin buried oxide SOI based electronics.</description><subject>Electric Conductivity</subject><subject>Equipment Design</subject><subject>Equipment Failure Analysis</subject><subject>Nanotechnology - instrumentation</subject><subject>Oxides - chemistry</subject><subject>Photometry - instrumentation</subject><subject>Photons</subject><subject>Silicon - chemistry</subject><issn>1094-4087</issn><issn>1094-4087</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><sourceid>EIF</sourceid><recordid>eNpN0D1PwzAUhWELgWgpbMzIGwsp_khiZ0RVgUgVGYDZsh1bNUrtYjsI_j1FLYjp3uHRGV4ALjGaY1qXt91yjvkcIcordASmGDVlUSLOjv_9E3CW0htCuGQNOwUTstMNbaopaJ-kD9t1yME7DXvz4bRJMHiY185DNUZnehg-XW_gsxucDr7ofNH6NA4yhwjTqFKOMpt0Dk6sHJK5ONwZeL1fviwei1X30C7uVoWmhOeiYqhSVhFNMMZlzaxS0nLcsL5ilqJS1rymFdKkQZYZVmtpiNE94prwRmJLZ-B6v7uN4X00KYuNS9oMg_QmjEkwSjmnNeY7ebOXOoaUorFiG91Gxi-BkfhpJ7qlwFzs2-341WF4VBvT_-HfWPQbJAppnw</recordid><startdate>20100215</startdate><enddate>20100215</enddate><creator>Sridaran, Suresh</creator><creator>Bhave, Sunil A</creator><scope>CGR</scope><scope>CUY</scope><scope>CVF</scope><scope>ECM</scope><scope>EIF</scope><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope></search><sort><creationdate>20100215</creationdate><title>Nanophotonic devices on thin buried oxide Silicon-On-Insulator substrates</title><author>Sridaran, Suresh ; Bhave, Sunil A</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c328t-5705bfb2c2111467fbbaf8197d57f304a686350c290f7e76cae2ecd08c289a1f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Electric Conductivity</topic><topic>Equipment Design</topic><topic>Equipment Failure Analysis</topic><topic>Nanotechnology - instrumentation</topic><topic>Oxides - chemistry</topic><topic>Photometry - instrumentation</topic><topic>Photons</topic><topic>Silicon - chemistry</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Sridaran, Suresh</creatorcontrib><creatorcontrib>Bhave, Sunil A</creatorcontrib><collection>Medline</collection><collection>MEDLINE</collection><collection>MEDLINE (Ovid)</collection><collection>MEDLINE</collection><collection>MEDLINE</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><jtitle>Optics express</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Sridaran, Suresh</au><au>Bhave, Sunil A</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Nanophotonic devices on thin buried oxide Silicon-On-Insulator substrates</atitle><jtitle>Optics express</jtitle><addtitle>Opt Express</addtitle><date>2010-02-15</date><risdate>2010</risdate><volume>18</volume><issue>4</issue><spage>3850</spage><epage>3857</epage><pages>3850-3857</pages><issn>1094-4087</issn><eissn>1094-4087</eissn><abstract>We demonstrate a silicon photonic platform using thin buried oxide silicon-on-insulator (SOI) substrates using localized substrate removal. We show high confinement silicon strip waveguides, micro-ring resonators and nanotapers using this technology. Propagation losses for the waveguides using the cutback method are 3.88 dB/cm for the quasi-TE mode and 5.06 dB/cm for the quasi-TM mode. Ring resonators with a loaded quality factor (Q) of 46,500 for the quasi-TM mode and intrinsic Q of 148,000 for the quasi-TE mode have been obtained. This process will enable the integration of photonic structures with thin buried oxide SOI based electronics.</abstract><cop>United States</cop><pmid>20389395</pmid><doi>10.1364/OE.18.003850</doi><tpages>8</tpages><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 1094-4087 |
| ispartof | Optics express, 2010-02, Vol.18 (4), p.3850-3857 |
| issn | 1094-4087 1094-4087 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_733883618 |
| source | MEDLINE; DOAJ Directory of Open Access Journals; EZB-FREE-00999 freely available EZB journals; Alma/SFX Local Collection |
| subjects | Electric Conductivity Equipment Design Equipment Failure Analysis Nanotechnology - instrumentation Oxides - chemistry Photometry - instrumentation Photons Silicon - chemistry |
| title | Nanophotonic devices on thin buried oxide Silicon-On-Insulator substrates |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-12T01%3A32%3A24IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Nanophotonic%20devices%20on%20thin%20buried%20oxide%20Silicon-On-Insulator%20substrates&rft.jtitle=Optics%20express&rft.au=Sridaran,%20Suresh&rft.date=2010-02-15&rft.volume=18&rft.issue=4&rft.spage=3850&rft.epage=3857&rft.pages=3850-3857&rft.issn=1094-4087&rft.eissn=1094-4087&rft_id=info:doi/10.1364/OE.18.003850&rft_dat=%3Cproquest_cross%3E733883618%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=733883618&rft_id=info:pmid/20389395&rfr_iscdi=true |