Structural and optical properties of silicon oxynitride on silicon planar waveguides
Planar optical waveguides on thermally oxidized Si(111) substrates have been made with rf magnetron sputtering deposition from a SiO(2) target in a N(2) and Ar reactive atmosphere. Reproducible guiding layers of silicon oxynitride with refractive index in the 1.6-1.9 range have been obtained changin...
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| Veröffentlicht in: | Applied Optics 1990-08, Vol.29 (24), p.3489-3496 |
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| container_title | Applied Optics |
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| creator | DEL GIUDICE, M BRUNO, F CICINELLI, T VALLI, M |
| description | Planar optical waveguides on thermally oxidized Si(111) substrates have been made with rf magnetron sputtering deposition from a SiO(2) target in a N(2) and Ar reactive atmosphere. Reproducible guiding layers of silicon oxynitride with refractive index in the 1.6-1.9 range have been obtained changing deposition parameters. A detailed study of the film characteristics in terms of optical and chemical properties is reported. The films are a mixture of SiO(2) and silicon oxynitride, with an extended intermixed region at the thermal SiO(2) buffer layer interface. Further annealing in N(2) atmosphere (600 degrees C < T < 1000 degrees C) resulted in waveguide attenuation values lower than 1 dB/cm for lambda = 0.633 microm. |
| doi_str_mv | 10.1364/AO.29.003489 |
| format | Article |
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Reproducible guiding layers of silicon oxynitride with refractive index in the 1.6-1.9 range have been obtained changing deposition parameters. A detailed study of the film characteristics in terms of optical and chemical properties is reported. The films are a mixture of SiO(2) and silicon oxynitride, with an extended intermixed region at the thermal SiO(2) buffer layer interface. 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Reproducible guiding layers of silicon oxynitride with refractive index in the 1.6-1.9 range have been obtained changing deposition parameters. A detailed study of the film characteristics in terms of optical and chemical properties is reported. The films are a mixture of SiO(2) and silicon oxynitride, with an extended intermixed region at the thermal SiO(2) buffer layer interface. 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| language | eng |
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| source | Alma/SFX Local Collection; Optica Publishing Group Journals |
| subjects | Exact sciences and technology Fundamental areas of phenomenology (including applications) Optical materials Optics Physics |
| title | Structural and optical properties of silicon oxynitride on silicon planar waveguides |
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