One-Step Photoembossing for Submicrometer Surface Relief Structures in Liquid Crystal Semiconductors

We report a new single-step method to directly imprint nanometer-scale structures on photoreactive organic semiconductors. A surface relief grating is spontaneously formed when a light-emitting, liquid crystalline, and semiconducting thin film is irradiated by patterned light generated using a phase...

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Veröffentlicht in:	ACS nano 2010-06, Vol.4 (6), p.3248-3253
Hauptverfasser:	Liedtke, Alicia, Lei, Chunhong, O’Neill, Mary, Dyer, Peter E, Kitney, Stuart P, Kelly, Stephen M
Format:	Artikel
Sprache:	eng
Schlagworte:	Crystallization - methods Equipment Design Equipment Failure Analysis Liquid Crystals - chemistry Macromolecular Substances - chemistry Materials Testing Molecular Conformation Nanostructures - chemistry Nanostructures - ultrastructure Nanotechnology - instrumentation Particle Size Photography - methods Semiconductors Surface Properties
Online-Zugang:	Volltext
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