One-Step Photoembossing for Submicrometer Surface Relief Structures in Liquid Crystal Semiconductors
We report a new single-step method to directly imprint nanometer-scale structures on photoreactive organic semiconductors. A surface relief grating is spontaneously formed when a light-emitting, liquid crystalline, and semiconducting thin film is irradiated by patterned light generated using a phase...
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| Veröffentlicht in: | ACS nano 2010-06, Vol.4 (6), p.3248-3253 |
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| container_title | ACS nano |
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| creator | Liedtke, Alicia Lei, Chunhong O’Neill, Mary Dyer, Peter E Kitney, Stuart P Kelly, Stephen M |
| description | We report a new single-step method to directly imprint nanometer-scale structures on photoreactive organic semiconductors. A surface relief grating is spontaneously formed when a light-emitting, liquid crystalline, and semiconducting thin film is irradiated by patterned light generated using a phase mask. Grating formation requires no postannealing nor wet etching so there is potential for high-throughput fabrication. The structured film is cross-linked for robustness. Gratings deeper than the original film thickness are made with periods as small as 265 nm. Grating formation is attributed to mass transfer, enhanced by self-assembly, from dark to illuminated regions. A photovoltaic device incorporating the grating is discussed. |
| doi_str_mv | 10.1021/nn100012g |
| format | Article |
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A photovoltaic device incorporating the grating is discussed.</description><subject>Crystallization - methods</subject><subject>Equipment Design</subject><subject>Equipment Failure Analysis</subject><subject>Liquid Crystals - chemistry</subject><subject>Macromolecular Substances - chemistry</subject><subject>Materials Testing</subject><subject>Molecular Conformation</subject><subject>Nanostructures - chemistry</subject><subject>Nanostructures - ultrastructure</subject><subject>Nanotechnology - instrumentation</subject><subject>Particle Size</subject><subject>Photography - methods</subject><subject>Semiconductors</subject><subject>Surface Properties</subject><issn>1936-0851</issn><issn>1936-086X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><sourceid>EIF</sourceid><recordid>eNptkMtKw0AUhgdRrFYXvoDMRsRFdCZzS5ZSvEGhYhTchenkTE1JMu3MZNG3N6W1KzfnAt_54XwIXVFyT0lKH7qOEkJoujhCZzRnMiGZ_D4-zIKO0HkIS0KEypQ8RaOUcCFExs9QNesgKSKs8PuPiw7auQuh7hbYOo-Lft7WxrsWImw3b7UB_AFNDRYX0fcm9h4Crjs8rdd9XeGJ34SoG1zAcOi6aiCcDxfoxOomwOW-j9HX89Pn5DWZzl7eJo_TRLOMxIRbUDznmVIVl5lKc54qyiE3qTBSmrkEqeU8BcE41xwAaJ4RYZmUKRfWAhuj213uyrt1DyGWbR0MNI3uwPWhVIwxRbd1jO525PBdCB5sufJ1q_2mpKTcOi0PTgf2ep866IDqQP5JHICbHaBNKJeu993w5D9BvxbTfks</recordid><startdate>20100622</startdate><enddate>20100622</enddate><creator>Liedtke, Alicia</creator><creator>Lei, Chunhong</creator><creator>O’Neill, Mary</creator><creator>Dyer, Peter E</creator><creator>Kitney, Stuart P</creator><creator>Kelly, Stephen M</creator><general>American Chemical Society</general><scope>CGR</scope><scope>CUY</scope><scope>CVF</scope><scope>ECM</scope><scope>EIF</scope><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope></search><sort><creationdate>20100622</creationdate><title>One-Step Photoembossing for Submicrometer Surface Relief Structures in Liquid Crystal Semiconductors</title><author>Liedtke, Alicia ; Lei, Chunhong ; O’Neill, Mary ; Dyer, Peter E ; Kitney, Stuart P ; Kelly, Stephen M</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-a380t-4fe7494877d46872942714e9c25c66cb6e6a6b2e5344a4eee19805f366245ffe3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Crystallization - methods</topic><topic>Equipment Design</topic><topic>Equipment Failure Analysis</topic><topic>Liquid Crystals - chemistry</topic><topic>Macromolecular Substances - chemistry</topic><topic>Materials Testing</topic><topic>Molecular Conformation</topic><topic>Nanostructures - chemistry</topic><topic>Nanostructures - ultrastructure</topic><topic>Nanotechnology - instrumentation</topic><topic>Particle Size</topic><topic>Photography - methods</topic><topic>Semiconductors</topic><topic>Surface Properties</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Liedtke, Alicia</creatorcontrib><creatorcontrib>Lei, Chunhong</creatorcontrib><creatorcontrib>O’Neill, Mary</creatorcontrib><creatorcontrib>Dyer, Peter E</creatorcontrib><creatorcontrib>Kitney, Stuart P</creatorcontrib><creatorcontrib>Kelly, Stephen M</creatorcontrib><collection>Medline</collection><collection>MEDLINE</collection><collection>MEDLINE (Ovid)</collection><collection>MEDLINE</collection><collection>MEDLINE</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><jtitle>ACS nano</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Liedtke, Alicia</au><au>Lei, Chunhong</au><au>O’Neill, Mary</au><au>Dyer, Peter E</au><au>Kitney, Stuart P</au><au>Kelly, Stephen M</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>One-Step Photoembossing for Submicrometer Surface Relief Structures in Liquid Crystal Semiconductors</atitle><jtitle>ACS nano</jtitle><addtitle>ACS Nano</addtitle><date>2010-06-22</date><risdate>2010</risdate><volume>4</volume><issue>6</issue><spage>3248</spage><epage>3253</epage><pages>3248-3253</pages><issn>1936-0851</issn><eissn>1936-086X</eissn><abstract>We report a new single-step method to directly imprint nanometer-scale structures on photoreactive organic semiconductors. 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| ispartof | ACS nano, 2010-06, Vol.4 (6), p.3248-3253 |
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| language | eng |
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| source | ACS Publications; MEDLINE |
| subjects | Crystallization - methods Equipment Design Equipment Failure Analysis Liquid Crystals - chemistry Macromolecular Substances - chemistry Materials Testing Molecular Conformation Nanostructures - chemistry Nanostructures - ultrastructure Nanotechnology - instrumentation Particle Size Photography - methods Semiconductors Surface Properties |
| title | One-Step Photoembossing for Submicrometer Surface Relief Structures in Liquid Crystal Semiconductors |
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