Phase change characteristics of aluminum doped Ge(2)Sb(2)Te(5) films prepared by magnetron sputtering

Aluminum-doped Ge(2)Sb(2)Te(5) (Al(x)GST) films were deposited on Si(100) substrates by co-magnetron sputtering system. The Aluminum concentrations in these films are determined by X-ray photoelectron spectroscopy (XPS). The influence of Al doping upon phase change characteristics of these Al(x)GST...

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Veröffentlicht in:Optics express 2007-08, Vol.15 (17), p.10584-10590
Hauptverfasser: Wei, Shenjin, Li, Jing, Wu, Xia, Zhou, Peng, Wang, Songyou, Zheng, Yuxiang, Chen, Liangyao, Gan, Fuxi, Zhang, Xia, Li, Guohua
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container_end_page 10590
container_issue 17
container_start_page 10584
container_title Optics express
container_volume 15
creator Wei, Shenjin
Li, Jing
Wu, Xia
Zhou, Peng
Wang, Songyou
Zheng, Yuxiang
Chen, Liangyao
Gan, Fuxi
Zhang, Xia
Li, Guohua
description Aluminum-doped Ge(2)Sb(2)Te(5) (Al(x)GST) films were deposited on Si(100) substrates by co-magnetron sputtering system. The Aluminum concentrations in these films are determined by X-ray photoelectron spectroscopy (XPS). The influence of Al doping upon phase change characteristics of these Al(x)GST alloy films has been investigated by X-ray diffraction (XRD) and a temperature-regulable UVISEL(TM) typed spectroscopic ellipsometry (TRSE). With the augment of Al doping concentration, the crystalline temperatures of Al(x)GST films went up while annealing, and the face-centered-cubic (fcc) phase had high thermal stability. The reflectivity contrast of the films increases obviously, which is effective to improve the signal to noise ratio (SNR) for optical phase-change storage.
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title Phase change characteristics of aluminum doped Ge(2)Sb(2)Te(5) films prepared by magnetron sputtering
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