Absolute reflectivity measurements at 44.79 Å of sputter deposited multilayer x-ray mirrors

Multilayer x-ray mirrors have been deposited using a dc triode sputtering system, which incorporates an accurate method of thickness monitoring based on the dependence of the deposition rate on the target current. Thickness can be controlled with an accuracy of better than 0.1 A. High efficiency W-C...

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Veröffentlicht in:	Applied Optics 1990-02, Vol.29 (4), p.477-482
Hauptverfasser:	ARBAOUI, M, BARCHEWITZ, R, SELLA, C, YOUN, K. B
Format:	Artikel
Sprache:	eng
Schlagworte:	Exact sciences and technology Instruments, apparatus, components and techniques common to several branches of physics and astronomy Physics X- and γ-ray instruments and techniques
Online-Zugang:	Volltext
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