On-line reoptimization of filter designs for multivariate optical elements

An automated method for producing multivariate optical element (MOE) interference filters that are robust to errors in the reactive magnetron sputtering process is described. Reactive magnetron sputtering produces films of excellent thickness and uniformity. However, small changes in the thickness o...

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Veröffentlicht in:	Applied Optics 2003-04, Vol.42 (10), p.1833-1838
Hauptverfasser:	Haibach, Frederick G, Greer, Ashley E, Schiza, Maria V, Priore, Ryan J, Soysmi, Olusola O, Myrick, Michael L
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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