Simultaneous measurement of surface geometry and material distribution by focusing ellipsotopometry

Simultaneous measurement of surface geometry and material distribution by focusing ellipsotopometry

A new method for total surface measurement based on reflection ellipsometry is presented. By scanning the surface of the target under test with a focused laser beam, one can measure the surface topography and its material distribution simultaneously with high lateral resolution. Target topography is...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Applied Optics 2002-08, Vol.41 (22), p.4526-4535
Hauptverfasser: Neuschaefer-Rube, Ulrich, Holzapfel, Wolfgang
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 4535
container_issue 22
container_start_page 4526
container_title Applied Optics
container_volume 41
creator Neuschaefer-Rube, Ulrich
Holzapfel, Wolfgang
description A new method for total surface measurement based on reflection ellipsometry is presented. By scanning the surface of the target under test with a focused laser beam, one can measure the surface topography and its material distribution simultaneously with high lateral resolution. Target topography is determined by ellipsometric measurement of local gradient angles gamma(x) and gamma(y) of the target's scanned surface elements. To identify the material, one measures the local complex refractive index n, too. The influence of beam focusing on the measurement results is discussed. We describe successful tests with various dielectric and metallic surfaces by use of He-Ne (632-nm) and He-Cd (442-nm) lasers.
doi_str_mv 10.1364/AO.41.004526
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_71948553</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>71948553</sourcerecordid><originalsourceid>FETCH-LOGICAL-c287t-7eac87851aed85b9cef34856ae2009d1710b84bedf18f797e01b3e3743888fa23</originalsourceid><addsrcrecordid>eNpFkD1PwzAQhi0EolDYmJEnJlLs2K6dsar4kip1ACS2yHHOlVEcF9sZ-u9JlUpM9wzPvbp7EbqjZEHZkj-ttgtOF4RwUS7P0BUVrCpGLs-PLKqClup7hq5T-iGECV7JSzSj5agRRa-Q-XB-6LLuIQwJe9BpiOChzzhYPLLVBvAOgoccD1j3LfY6Q3S6w61LObpmyC70uDlgG8yQXL_D0HVun0IO-2ntBl1Y3SW4Pc05-np5_ly_FZvt6_t6tSlMqWQuJGijpBJUQ6tEUxmwjCux1FASUrVUUtIo3kBrqbKykkBow4BJzpRSVpdsjh6m3H0MvwOkXHuXzHjN9F0taTXmCTaKj5NoYkgpgq330XkdDzUl9bHUerWtOa2nUkf9_pQ7NB7af_nUIvsDpmZ0oA</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>71948553</pqid></control><display><type>article</type><title>Simultaneous measurement of surface geometry and material distribution by focusing ellipsotopometry</title><source>Alma/SFX Local Collection</source><source>Optica Publishing Group Journals</source><creator>Neuschaefer-Rube, Ulrich ; Holzapfel, Wolfgang</creator><creatorcontrib>Neuschaefer-Rube, Ulrich ; Holzapfel, Wolfgang</creatorcontrib><description>A new method for total surface measurement based on reflection ellipsometry is presented. By scanning the surface of the target under test with a focused laser beam, one can measure the surface topography and its material distribution simultaneously with high lateral resolution. Target topography is determined by ellipsometric measurement of local gradient angles gamma(x) and gamma(y) of the target's scanned surface elements. To identify the material, one measures the local complex refractive index n, too. The influence of beam focusing on the measurement results is discussed. We describe successful tests with various dielectric and metallic surfaces by use of He-Ne (632-nm) and He-Cd (442-nm) lasers.</description><identifier>ISSN: 1559-128X</identifier><identifier>ISSN: 0003-6935</identifier><identifier>EISSN: 1539-4522</identifier><identifier>DOI: 10.1364/AO.41.004526</identifier><identifier>PMID: 12153081</identifier><language>eng</language><publisher>United States</publisher><ispartof>Applied Optics, 2002-08, Vol.41 (22), p.4526-4535</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c287t-7eac87851aed85b9cef34856ae2009d1710b84bedf18f797e01b3e3743888fa23</citedby><cites>FETCH-LOGICAL-c287t-7eac87851aed85b9cef34856ae2009d1710b84bedf18f797e01b3e3743888fa23</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,777,781,27905,27906</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/12153081$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Neuschaefer-Rube, Ulrich</creatorcontrib><creatorcontrib>Holzapfel, Wolfgang</creatorcontrib><title>Simultaneous measurement of surface geometry and material distribution by focusing ellipsotopometry</title><title>Applied Optics</title><addtitle>Appl Opt</addtitle><description>A new method for total surface measurement based on reflection ellipsometry is presented. By scanning the surface of the target under test with a focused laser beam, one can measure the surface topography and its material distribution simultaneously with high lateral resolution. Target topography is determined by ellipsometric measurement of local gradient angles gamma(x) and gamma(y) of the target's scanned surface elements. To identify the material, one measures the local complex refractive index n, too. The influence of beam focusing on the measurement results is discussed. We describe successful tests with various dielectric and metallic surfaces by use of He-Ne (632-nm) and He-Cd (442-nm) lasers.</description><issn>1559-128X</issn><issn>0003-6935</issn><issn>1539-4522</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2002</creationdate><recordtype>article</recordtype><recordid>eNpFkD1PwzAQhi0EolDYmJEnJlLs2K6dsar4kip1ACS2yHHOlVEcF9sZ-u9JlUpM9wzPvbp7EbqjZEHZkj-ttgtOF4RwUS7P0BUVrCpGLs-PLKqClup7hq5T-iGECV7JSzSj5agRRa-Q-XB-6LLuIQwJe9BpiOChzzhYPLLVBvAOgoccD1j3LfY6Q3S6w61LObpmyC70uDlgG8yQXL_D0HVun0IO-2ntBl1Y3SW4Pc05-np5_ly_FZvt6_t6tSlMqWQuJGijpBJUQ6tEUxmwjCux1FASUrVUUtIo3kBrqbKykkBow4BJzpRSVpdsjh6m3H0MvwOkXHuXzHjN9F0taTXmCTaKj5NoYkgpgq330XkdDzUl9bHUerWtOa2nUkf9_pQ7NB7af_nUIvsDpmZ0oA</recordid><startdate>20020801</startdate><enddate>20020801</enddate><creator>Neuschaefer-Rube, Ulrich</creator><creator>Holzapfel, Wolfgang</creator><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope></search><sort><creationdate>20020801</creationdate><title>Simultaneous measurement of surface geometry and material distribution by focusing ellipsotopometry</title><author>Neuschaefer-Rube, Ulrich ; Holzapfel, Wolfgang</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c287t-7eac87851aed85b9cef34856ae2009d1710b84bedf18f797e01b3e3743888fa23</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2002</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Neuschaefer-Rube, Ulrich</creatorcontrib><creatorcontrib>Holzapfel, Wolfgang</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><jtitle>Applied Optics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Neuschaefer-Rube, Ulrich</au><au>Holzapfel, Wolfgang</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Simultaneous measurement of surface geometry and material distribution by focusing ellipsotopometry</atitle><jtitle>Applied Optics</jtitle><addtitle>Appl Opt</addtitle><date>2002-08-01</date><risdate>2002</risdate><volume>41</volume><issue>22</issue><spage>4526</spage><epage>4535</epage><pages>4526-4535</pages><issn>1559-128X</issn><issn>0003-6935</issn><eissn>1539-4522</eissn><abstract>A new method for total surface measurement based on reflection ellipsometry is presented. By scanning the surface of the target under test with a focused laser beam, one can measure the surface topography and its material distribution simultaneously with high lateral resolution. Target topography is determined by ellipsometric measurement of local gradient angles gamma(x) and gamma(y) of the target's scanned surface elements. To identify the material, one measures the local complex refractive index n, too. The influence of beam focusing on the measurement results is discussed. We describe successful tests with various dielectric and metallic surfaces by use of He-Ne (632-nm) and He-Cd (442-nm) lasers.</abstract><cop>United States</cop><pmid>12153081</pmid><doi>10.1364/AO.41.004526</doi><tpages>10</tpages></addata></record>
fulltext fulltext
identifier ISSN: 1559-128X
ispartof Applied Optics, 2002-08, Vol.41 (22), p.4526-4535
issn 1559-128X
0003-6935
1539-4522
language eng
recordid cdi_proquest_miscellaneous_71948553
source Alma/SFX Local Collection; Optica Publishing Group Journals
title Simultaneous measurement of surface geometry and material distribution by focusing ellipsotopometry
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-19T21%3A55%3A33IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Simultaneous%20measurement%20of%20surface%20geometry%20and%20material%20distribution%20by%20focusing%20ellipsotopometry&rft.jtitle=Applied%20Optics&rft.au=Neuschaefer-Rube,%20Ulrich&rft.date=2002-08-01&rft.volume=41&rft.issue=22&rft.spage=4526&rft.epage=4535&rft.pages=4526-4535&rft.issn=1559-128X&rft.eissn=1539-4522&rft_id=info:doi/10.1364/AO.41.004526&rft_dat=%3Cproquest_cross%3E71948553%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=71948553&rft_id=info:pmid/12153081&rfr_iscdi=true