Bond insertion, complexation, and penetration pathways of vapor-deposited aluminum atoms with HO- and CH(3)O-terminated organic monolayers

The interaction of vapor-deposited Al atoms with self-assembled monolayers (SAMs) of HS-(CH(2))(16)-X (X = -OH and -OCH(3)) chemisorbed at polycrystalline Au[111] surfaces was studied using time-of-flight secondary-ion mass spectrometry, X-ray photoelectron spectroscopy, and infrared reflectance spe...

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Veröffentlicht in:Journal of the American Chemical Society 2002-05, Vol.124 (19), p.5528-5541
Hauptverfasser: Fisher, Gregory L, Walker, Amy V, Hooper, Andrew E, Tighe, Timothy B, Bahnck, Kevin B, Skriba, Hope T, Reinard, Michael D, Haynie, Brendan C, Opila, Robert L, Winograd, Nicholas, Allara, David L
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Sprache:eng
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