Correct height measurement in noncontact atomic force microscopy

We demonstrate that topography measurements by noncontact atomic force microscopy are subject to residual electrostatic forces. On highly oriented pyrolitic graphite (HOPG) with a submonolayer coverage of C60, we monitor the step height from C60 to HOPG as a function of dc bias between tip and sampl...

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Veröffentlicht in:	Physical review letters 2003-12, Vol.91 (26 Pt 1), p.266101-266101, Article 266101
Hauptverfasser:	Sadewasser, Sascha, Lux-Steiner, Martha Ch
Format:	Artikel
Sprache:	eng
Schlagworte:	Graphite - chemistry Microscopy, Atomic Force - methods Static Electricity
Online-Zugang:	Volltext
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