Plasma-Induced Formation of Ag Nanodots for Ultra-High-Enhancement Surface-Enhanced Raman Scattering Substrates
We report here plasma-induced formation of Ag nanostructures for surface-enhanced Raman scattering (SERS) applications. An array of uniform Ag patterned structures of 150 nm diameter was first fabricated on a silicon substrate with imprint lithography; then the substrate was further treated with an...
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| Veröffentlicht in: | Langmuir 2007-04, Vol.23 (9), p.5135-5138 |
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| container_title | Langmuir |
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| creator | Li, Zhiyong Tong, William M Stickle, William F Neiman, David L Williams, R. Stanley Hunter, Luke L Talin, A. Alec Li, D Brueck, S. R. J |
| description | We report here plasma-induced formation of Ag nanostructures for surface-enhanced Raman scattering (SERS) applications. An array of uniform Ag patterned structures of 150 nm diameter was first fabricated on a silicon substrate with imprint lithography; then the substrate was further treated with an oxygen plasma to fracture the patterned structures into clusters of smaller, interconnected, closely packed Ag nanoparticles (20−60 nm) and redeposited Ag nanodots (∼10 nm) between the clusters. The substrate thus formed had a uniform ultrahigh SERS enhancement factor (1010) over the entire substrate for 4-mercaptophenol molecules. By comparison, Au patterned structures fabricated with the same method did not undergo such a morphological change after the plasma treatment and showed no enhancement of Raman scattering. |
| doi_str_mv | 10.1021/la063688n |
| format | Article |
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Stanley ; Hunter, Luke L ; Talin, A. Alec ; Li, D ; Brueck, S. R. J</creator><creatorcontrib>Li, Zhiyong ; Tong, William M ; Stickle, William F ; Neiman, David L ; Williams, R. Stanley ; Hunter, Luke L ; Talin, A. Alec ; Li, D ; Brueck, S. R. J</creatorcontrib><description>We report here plasma-induced formation of Ag nanostructures for surface-enhanced Raman scattering (SERS) applications. An array of uniform Ag patterned structures of 150 nm diameter was first fabricated on a silicon substrate with imprint lithography; then the substrate was further treated with an oxygen plasma to fracture the patterned structures into clusters of smaller, interconnected, closely packed Ag nanoparticles (20−60 nm) and redeposited Ag nanodots (∼10 nm) between the clusters. The substrate thus formed had a uniform ultrahigh SERS enhancement factor (1010) over the entire substrate for 4-mercaptophenol molecules. By comparison, Au patterned structures fabricated with the same method did not undergo such a morphological change after the plasma treatment and showed no enhancement of Raman scattering.</description><identifier>ISSN: 0743-7463</identifier><identifier>EISSN: 1520-5827</identifier><identifier>DOI: 10.1021/la063688n</identifier><identifier>PMID: 17385901</identifier><identifier>CODEN: LANGD5</identifier><language>eng</language><publisher>Washington, DC: American Chemical Society</publisher><subject>Adsorption ; Chemistry ; Colloidal state and disperse state ; Exact sciences and technology ; General and physical chemistry ; Nanostructures - chemistry ; Oxygen - chemistry ; Particle Size ; Phenols - chemistry ; Physical and chemical studies. Granulometry. Electrokinetic phenomena ; Sensitivity and Specificity ; Silicon - chemistry ; Silver - chemistry ; Spectrum Analysis, Raman - methods ; Sulfhydryl Compounds - chemistry ; Surface Properties</subject><ispartof>Langmuir, 2007-04, Vol.23 (9), p.5135-5138</ispartof><rights>Copyright © 2007 American Chemical Society</rights><rights>2007 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-a447t-4f5e835c86ca4d016d5f9b4fd4df7ee8db7de5e587b364d0f1f7555f8e7de1833</citedby><cites>FETCH-LOGICAL-a447t-4f5e835c86ca4d016d5f9b4fd4df7ee8db7de5e587b364d0f1f7555f8e7de1833</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://pubs.acs.org/doi/pdf/10.1021/la063688n$$EPDF$$P50$$Gacs$$H</linktopdf><linktohtml>$$Uhttps://pubs.acs.org/doi/10.1021/la063688n$$EHTML$$P50$$Gacs$$H</linktohtml><link.rule.ids>314,780,784,2763,27074,27922,27923,56736,56786</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=18714572$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/17385901$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Li, Zhiyong</creatorcontrib><creatorcontrib>Tong, William M</creatorcontrib><creatorcontrib>Stickle, William F</creatorcontrib><creatorcontrib>Neiman, David L</creatorcontrib><creatorcontrib>Williams, R. Stanley</creatorcontrib><creatorcontrib>Hunter, Luke L</creatorcontrib><creatorcontrib>Talin, A. Alec</creatorcontrib><creatorcontrib>Li, D</creatorcontrib><creatorcontrib>Brueck, S. R. J</creatorcontrib><title>Plasma-Induced Formation of Ag Nanodots for Ultra-High-Enhancement Surface-Enhanced Raman Scattering Substrates</title><title>Langmuir</title><addtitle>Langmuir</addtitle><description>We report here plasma-induced formation of Ag nanostructures for surface-enhanced Raman scattering (SERS) applications. An array of uniform Ag patterned structures of 150 nm diameter was first fabricated on a silicon substrate with imprint lithography; then the substrate was further treated with an oxygen plasma to fracture the patterned structures into clusters of smaller, interconnected, closely packed Ag nanoparticles (20−60 nm) and redeposited Ag nanodots (∼10 nm) between the clusters. The substrate thus formed had a uniform ultrahigh SERS enhancement factor (1010) over the entire substrate for 4-mercaptophenol molecules. By comparison, Au patterned structures fabricated with the same method did not undergo such a morphological change after the plasma treatment and showed no enhancement of Raman scattering.</description><subject>Adsorption</subject><subject>Chemistry</subject><subject>Colloidal state and disperse state</subject><subject>Exact sciences and technology</subject><subject>General and physical chemistry</subject><subject>Nanostructures - chemistry</subject><subject>Oxygen - chemistry</subject><subject>Particle Size</subject><subject>Phenols - chemistry</subject><subject>Physical and chemical studies. Granulometry. Electrokinetic phenomena</subject><subject>Sensitivity and Specificity</subject><subject>Silicon - chemistry</subject><subject>Silver - chemistry</subject><subject>Spectrum Analysis, Raman - methods</subject><subject>Sulfhydryl Compounds - chemistry</subject><subject>Surface Properties</subject><issn>0743-7463</issn><issn>1520-5827</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2007</creationdate><recordtype>article</recordtype><sourceid>EIF</sourceid><recordid>eNpt0EFrFDEUB_Agit1WD34BmYtCD6PJJplkj2VpbaFodVvwFt4kL9upM0lNMqDf3siu3YunwMvv_Xn8CXnD6AdGl-zjCLTjndbhGVkwuaSt1Ev1nCyoErxVouNH5DjnB0rpiovVS3LEFNdyRdmCxJsR8gTtVXCzRddcxDRBGWJoom_Ots1nCNHFkhsfU3M3lgTt5bC9b8_DPQSLE4bSbObkweK_mWu-wQSh2VgoBdMQtlX0ua4WzK_ICw9jxtf794TcXZzfri_b6y-frtZn1y0IoUorvETNpdWdBeEo65z0q154J5xXiNr1yqFEqVXPuwo880pK6TXWOdOcn5D3u9zHFH_OmIuZhmxxHCFgnLNRlK8EE7TC0x20Keac0JvHNEyQfhtGzd92zVO71b7dh879hO4g93VW8G4PIFsYfap9DPngtGJCqmV17c4NueCvp39IP0ynuJLm9mZjONPr7-uv2ohDLthsHuKcQu3uPwf-AYEbnhM</recordid><startdate>20070424</startdate><enddate>20070424</enddate><creator>Li, Zhiyong</creator><creator>Tong, William M</creator><creator>Stickle, William F</creator><creator>Neiman, David L</creator><creator>Williams, R. 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J</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-a447t-4f5e835c86ca4d016d5f9b4fd4df7ee8db7de5e587b364d0f1f7555f8e7de1833</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2007</creationdate><topic>Adsorption</topic><topic>Chemistry</topic><topic>Colloidal state and disperse state</topic><topic>Exact sciences and technology</topic><topic>General and physical chemistry</topic><topic>Nanostructures - chemistry</topic><topic>Oxygen - chemistry</topic><topic>Particle Size</topic><topic>Phenols - chemistry</topic><topic>Physical and chemical studies. Granulometry. Electrokinetic phenomena</topic><topic>Sensitivity and Specificity</topic><topic>Silicon - chemistry</topic><topic>Silver - chemistry</topic><topic>Spectrum Analysis, Raman - methods</topic><topic>Sulfhydryl Compounds - chemistry</topic><topic>Surface Properties</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Li, Zhiyong</creatorcontrib><creatorcontrib>Tong, William M</creatorcontrib><creatorcontrib>Stickle, William F</creatorcontrib><creatorcontrib>Neiman, David L</creatorcontrib><creatorcontrib>Williams, R. Stanley</creatorcontrib><creatorcontrib>Hunter, Luke L</creatorcontrib><creatorcontrib>Talin, A. Alec</creatorcontrib><creatorcontrib>Li, D</creatorcontrib><creatorcontrib>Brueck, S. R. 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J</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Plasma-Induced Formation of Ag Nanodots for Ultra-High-Enhancement Surface-Enhanced Raman Scattering Substrates</atitle><jtitle>Langmuir</jtitle><addtitle>Langmuir</addtitle><date>2007-04-24</date><risdate>2007</risdate><volume>23</volume><issue>9</issue><spage>5135</spage><epage>5138</epage><pages>5135-5138</pages><issn>0743-7463</issn><eissn>1520-5827</eissn><coden>LANGD5</coden><abstract>We report here plasma-induced formation of Ag nanostructures for surface-enhanced Raman scattering (SERS) applications. An array of uniform Ag patterned structures of 150 nm diameter was first fabricated on a silicon substrate with imprint lithography; then the substrate was further treated with an oxygen plasma to fracture the patterned structures into clusters of smaller, interconnected, closely packed Ag nanoparticles (20−60 nm) and redeposited Ag nanodots (∼10 nm) between the clusters. The substrate thus formed had a uniform ultrahigh SERS enhancement factor (1010) over the entire substrate for 4-mercaptophenol molecules. By comparison, Au patterned structures fabricated with the same method did not undergo such a morphological change after the plasma treatment and showed no enhancement of Raman scattering.</abstract><cop>Washington, DC</cop><pub>American Chemical Society</pub><pmid>17385901</pmid><doi>10.1021/la063688n</doi><tpages>4</tpages></addata></record> |
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| subjects | Adsorption Chemistry Colloidal state and disperse state Exact sciences and technology General and physical chemistry Nanostructures - chemistry Oxygen - chemistry Particle Size Phenols - chemistry Physical and chemical studies. Granulometry. Electrokinetic phenomena Sensitivity and Specificity Silicon - chemistry Silver - chemistry Spectrum Analysis, Raman - methods Sulfhydryl Compounds - chemistry Surface Properties |
| title | Plasma-Induced Formation of Ag Nanodots for Ultra-High-Enhancement Surface-Enhanced Raman Scattering Substrates |
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