Autocatalytic Water Dissociation on Cu(110) at Near Ambient Conditions

Autocatalytic Water Dissociation on Cu(110) at Near Ambient Conditions

Autocatalytic dissociation of water on the Cu(110) metal surface is demonstrated on the basis of X-ray photoelectron spectroscopy studies carried out in situ under near ambient conditions of water vapor pressure (1 Torr) and temperature (275−520 K). The autocatalytic reaction is explained as the res...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of the American Chemical Society 2008-03, Vol.130 (9), p.2793-2797
Hauptverfasser: Andersson, Klas, Ketteler, Guido, Bluhm, Hendrik, Yamamoto, Susumu, Ogasawara, Hirohito, Pettersson, Lars G. M, Salmeron, Miquel, Nilsson, Anders
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 2797
container_issue 9
container_start_page 2793
container_title Journal of the American Chemical Society
container_volume 130
creator Andersson, Klas
Ketteler, Guido
Bluhm, Hendrik
Yamamoto, Susumu
Ogasawara, Hirohito
Pettersson, Lars G. M
Salmeron, Miquel
Nilsson, Anders
description Autocatalytic dissociation of water on the Cu(110) metal surface is demonstrated on the basis of X-ray photoelectron spectroscopy studies carried out in situ under near ambient conditions of water vapor pressure (1 Torr) and temperature (275−520 K). The autocatalytic reaction is explained as the result of the strong hydrogen-bond in the H2O−OH complex of the dissociated final state, which lowers the water dissociation barrier according to the Brønsted−Evans−Polanyi relations. A simple chemical bonding picture is presented which predicts autocatalytic water dissociation to be a general phenomenon on metal surfaces.
doi_str_mv 10.1021/ja073727x
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_70342976</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>70342976</sourcerecordid><originalsourceid>FETCH-LOGICAL-a452t-3d5375f76e5f8bbfa8a52f7925f2f4f334c04d89c6aa5a00c7d3f07c882e68953</originalsourceid><addsrcrecordid>eNpt0F1LwzAUBuAgipvTC_-A9EZxF9V8NE16OeonjKk48TKcpQlkbq0mKWz_3o6NeSMEDuE8vAdehM4JviGYkts5YMEEFasD1Cec4pQTmh-iPsaYpkLmrIdOQph334xKcox6RFIuOC_66GHUxkZDhMU6Op18QjQ-uXMhNNpBdE2ddK9srwnBwwRiMjHgk9Fy5kwdk7KpK7dB4RQdWVgEc7abA_TxcD8tn9Lxy-NzORqnkHEaU1ZxJrgVueFWzmYWJHBqRUG5pTazjGUaZ5UsdA7AAWMtKmax0FJSk8uCswG62uZ---anNSGqpQvaLBZQm6YNSmCW0ULkHRxuofZNCN5Y9e3dEvxaEaw2pal9aZ292IW2s6Wp_uSupQ6kW-BCNKv9HvyXyrsMrqav7-qNFuXjJOOKdv5y60EHNW9aX3ed_HP4FwBFgIg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>70342976</pqid></control><display><type>article</type><title>Autocatalytic Water Dissociation on Cu(110) at Near Ambient Conditions</title><source>American Chemical Society Journals</source><creator>Andersson, Klas ; Ketteler, Guido ; Bluhm, Hendrik ; Yamamoto, Susumu ; Ogasawara, Hirohito ; Pettersson, Lars G. M ; Salmeron, Miquel ; Nilsson, Anders</creator><creatorcontrib>Andersson, Klas ; Ketteler, Guido ; Bluhm, Hendrik ; Yamamoto, Susumu ; Ogasawara, Hirohito ; Pettersson, Lars G. M ; Salmeron, Miquel ; Nilsson, Anders</creatorcontrib><description>Autocatalytic dissociation of water on the Cu(110) metal surface is demonstrated on the basis of X-ray photoelectron spectroscopy studies carried out in situ under near ambient conditions of water vapor pressure (1 Torr) and temperature (275−520 K). The autocatalytic reaction is explained as the result of the strong hydrogen-bond in the H2O−OH complex of the dissociated final state, which lowers the water dissociation barrier according to the Brønsted−Evans−Polanyi relations. A simple chemical bonding picture is presented which predicts autocatalytic water dissociation to be a general phenomenon on metal surfaces.</description><identifier>ISSN: 0002-7863</identifier><identifier>EISSN: 1520-5126</identifier><identifier>DOI: 10.1021/ja073727x</identifier><identifier>PMID: 18257559</identifier><language>eng</language><publisher>United States: American Chemical Society</publisher><ispartof>Journal of the American Chemical Society, 2008-03, Vol.130 (9), p.2793-2797</ispartof><rights>Copyright © 2008 American Chemical Society</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-a452t-3d5375f76e5f8bbfa8a52f7925f2f4f334c04d89c6aa5a00c7d3f07c882e68953</citedby><cites>FETCH-LOGICAL-a452t-3d5375f76e5f8bbfa8a52f7925f2f4f334c04d89c6aa5a00c7d3f07c882e68953</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://pubs.acs.org/doi/pdf/10.1021/ja073727x$$EPDF$$P50$$Gacs$$H</linktopdf><linktohtml>$$Uhttps://pubs.acs.org/doi/10.1021/ja073727x$$EHTML$$P50$$Gacs$$H</linktohtml><link.rule.ids>314,780,784,2765,27076,27924,27925,56738,56788</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/18257559$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Andersson, Klas</creatorcontrib><creatorcontrib>Ketteler, Guido</creatorcontrib><creatorcontrib>Bluhm, Hendrik</creatorcontrib><creatorcontrib>Yamamoto, Susumu</creatorcontrib><creatorcontrib>Ogasawara, Hirohito</creatorcontrib><creatorcontrib>Pettersson, Lars G. M</creatorcontrib><creatorcontrib>Salmeron, Miquel</creatorcontrib><creatorcontrib>Nilsson, Anders</creatorcontrib><title>Autocatalytic Water Dissociation on Cu(110) at Near Ambient Conditions</title><title>Journal of the American Chemical Society</title><addtitle>J. Am. Chem. Soc</addtitle><description>Autocatalytic dissociation of water on the Cu(110) metal surface is demonstrated on the basis of X-ray photoelectron spectroscopy studies carried out in situ under near ambient conditions of water vapor pressure (1 Torr) and temperature (275−520 K). The autocatalytic reaction is explained as the result of the strong hydrogen-bond in the H2O−OH complex of the dissociated final state, which lowers the water dissociation barrier according to the Brønsted−Evans−Polanyi relations. A simple chemical bonding picture is presented which predicts autocatalytic water dissociation to be a general phenomenon on metal surfaces.</description><issn>0002-7863</issn><issn>1520-5126</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2008</creationdate><recordtype>article</recordtype><recordid>eNpt0F1LwzAUBuAgipvTC_-A9EZxF9V8NE16OeonjKk48TKcpQlkbq0mKWz_3o6NeSMEDuE8vAdehM4JviGYkts5YMEEFasD1Cec4pQTmh-iPsaYpkLmrIdOQph334xKcox6RFIuOC_66GHUxkZDhMU6Op18QjQ-uXMhNNpBdE2ddK9srwnBwwRiMjHgk9Fy5kwdk7KpK7dB4RQdWVgEc7abA_TxcD8tn9Lxy-NzORqnkHEaU1ZxJrgVueFWzmYWJHBqRUG5pTazjGUaZ5UsdA7AAWMtKmax0FJSk8uCswG62uZ---anNSGqpQvaLBZQm6YNSmCW0ULkHRxuofZNCN5Y9e3dEvxaEaw2pal9aZ292IW2s6Wp_uSupQ6kW-BCNKv9HvyXyrsMrqav7-qNFuXjJOOKdv5y60EHNW9aX3ed_HP4FwBFgIg</recordid><startdate>20080305</startdate><enddate>20080305</enddate><creator>Andersson, Klas</creator><creator>Ketteler, Guido</creator><creator>Bluhm, Hendrik</creator><creator>Yamamoto, Susumu</creator><creator>Ogasawara, Hirohito</creator><creator>Pettersson, Lars G. M</creator><creator>Salmeron, Miquel</creator><creator>Nilsson, Anders</creator><general>American Chemical Society</general><scope>BSCLL</scope><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope></search><sort><creationdate>20080305</creationdate><title>Autocatalytic Water Dissociation on Cu(110) at Near Ambient Conditions</title><author>Andersson, Klas ; Ketteler, Guido ; Bluhm, Hendrik ; Yamamoto, Susumu ; Ogasawara, Hirohito ; Pettersson, Lars G. M ; Salmeron, Miquel ; Nilsson, Anders</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-a452t-3d5375f76e5f8bbfa8a52f7925f2f4f334c04d89c6aa5a00c7d3f07c882e68953</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2008</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Andersson, Klas</creatorcontrib><creatorcontrib>Ketteler, Guido</creatorcontrib><creatorcontrib>Bluhm, Hendrik</creatorcontrib><creatorcontrib>Yamamoto, Susumu</creatorcontrib><creatorcontrib>Ogasawara, Hirohito</creatorcontrib><creatorcontrib>Pettersson, Lars G. M</creatorcontrib><creatorcontrib>Salmeron, Miquel</creatorcontrib><creatorcontrib>Nilsson, Anders</creatorcontrib><collection>Istex</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><jtitle>Journal of the American Chemical Society</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Andersson, Klas</au><au>Ketteler, Guido</au><au>Bluhm, Hendrik</au><au>Yamamoto, Susumu</au><au>Ogasawara, Hirohito</au><au>Pettersson, Lars G. M</au><au>Salmeron, Miquel</au><au>Nilsson, Anders</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Autocatalytic Water Dissociation on Cu(110) at Near Ambient Conditions</atitle><jtitle>Journal of the American Chemical Society</jtitle><addtitle>J. Am. Chem. Soc</addtitle><date>2008-03-05</date><risdate>2008</risdate><volume>130</volume><issue>9</issue><spage>2793</spage><epage>2797</epage><pages>2793-2797</pages><issn>0002-7863</issn><eissn>1520-5126</eissn><abstract>Autocatalytic dissociation of water on the Cu(110) metal surface is demonstrated on the basis of X-ray photoelectron spectroscopy studies carried out in situ under near ambient conditions of water vapor pressure (1 Torr) and temperature (275−520 K). The autocatalytic reaction is explained as the result of the strong hydrogen-bond in the H2O−OH complex of the dissociated final state, which lowers the water dissociation barrier according to the Brønsted−Evans−Polanyi relations. A simple chemical bonding picture is presented which predicts autocatalytic water dissociation to be a general phenomenon on metal surfaces.</abstract><cop>United States</cop><pub>American Chemical Society</pub><pmid>18257559</pmid><doi>10.1021/ja073727x</doi><tpages>5</tpages><oa>free_for_read</oa></addata></record>
fulltext fulltext
identifier ISSN: 0002-7863
ispartof Journal of the American Chemical Society, 2008-03, Vol.130 (9), p.2793-2797
issn 0002-7863
1520-5126
language eng
recordid cdi_proquest_miscellaneous_70342976
source American Chemical Society Journals
title Autocatalytic Water Dissociation on Cu(110) at Near Ambient Conditions
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-29T01%3A48%3A37IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Autocatalytic%20Water%20Dissociation%20on%20Cu(110)%20at%20Near%20Ambient%20Conditions&rft.jtitle=Journal%20of%20the%20American%20Chemical%20Society&rft.au=Andersson,%20Klas&rft.date=2008-03-05&rft.volume=130&rft.issue=9&rft.spage=2793&rft.epage=2797&rft.pages=2793-2797&rft.issn=0002-7863&rft.eissn=1520-5126&rft_id=info:doi/10.1021/ja073727x&rft_dat=%3Cproquest_cross%3E70342976%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=70342976&rft_id=info:pmid/18257559&rfr_iscdi=true