Mechanisms of Atomic Layer Deposition on Substrates with Ultrahigh Aspect Ratios

Atomic layer deposition (ALD) appears to be uniquely suited for coating substrates with ultrahigh aspect ratios (≳103), including nanoporous solids. Here, we study the ALD of Cu and Cu3N on the inner surfaces of low-density nanoporous silica aerogel monoliths. Results show that Cu depth profiles in...

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Veröffentlicht in:	Langmuir 2008-02, Vol.24 (3), p.943-948
Hauptverfasser:	Kucheyev, S. O, Biener, J, Baumann, T. F, Wang, Y. M, Hamza, A. V, Li, Z, Lee, D. K, Gordon, R. G
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemistry Colloidal state and disperse state Exact sciences and technology General and physical chemistry Porous materials Surface physical chemistry
Online-Zugang:	Volltext
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