Influence of doping rate in Er3+:ZnO films on emission characteristics

High-quality Er(3+):ZnO films were grown by the pulsed-laser deposition technique for 0.5 and 2 wt. % Er doping. Two peaks were observed at approximately 1.54 microm in the photoluminescence spectra of samples with 2 wt. % doping contrary to only one peak in the 0.5 wt. % doped sample. Both peaks we...

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Veröffentlicht in:Optics letters 2008-04, Vol.33 (8), p.815-817
Hauptverfasser: DOUGLAS, L, MUNDLE, R, KONDA, R, BONNER, C. E, PRADHAN, A. K, SAHU, D. R, HUANG, J.-L
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container_end_page 817
container_issue 8
container_start_page 815
container_title Optics letters
container_volume 33
creator DOUGLAS, L
MUNDLE, R
KONDA, R
BONNER, C. E
PRADHAN, A. K
SAHU, D. R
HUANG, J.-L
description High-quality Er(3+):ZnO films were grown by the pulsed-laser deposition technique for 0.5 and 2 wt. % Er doping. Two peaks were observed at approximately 1.54 microm in the photoluminescence spectra of samples with 2 wt. % doping contrary to only one peak in the 0.5 wt. % doped sample. Both peaks were found to be strongly temperature dependent. The microscopic studies clearly illustrate that the appearance of the additional peak is attributed to the environment of Er(3+) ions in the form of ErO(6) clusters, which are optically active centers in the ZnO matrix. These results are very important for designing waveguides for telecommunications.
doi_str_mv 10.1364/OL.33.000815
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subjects Exact sciences and technology
Fundamental areas of phenomenology (including applications)
Optical materials
Optics
Other nonlinear optical materials
photorefractive and semiconductor materials
Physics
title Influence of doping rate in Er3+:ZnO films on emission characteristics
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