Two-photon photochemical long-period grating fabrication in pure-fused-silica photonic crystal fiber

We report what is to our knowledge the first photochemical fabrication of a long-period grating in a pure-fused-silica photonic crystal fiber. The inscription technique is based on a two-photon absorption mechanism and does not require a specially designed photonic crystal fiber with a photosensitive Ge-doped core. The characteristic fluence value for the inscription is an order of magnitude less than that for a standard telecom fiber irradiated under similar conditions with the same grating parameters.