Soft-UV Photolithography using Self-Assembled Monolayers

We report thiol-on-gold self-assembled monolayers (SAMs) that can be photodeprotected using soft UV irradiation (λ = 365 nm) to yield CO2H functionalized surfaces complementing those reported previously, which yielded NH2 functionalized surfaces. The photolysis of these SAMs were monitored using a c...

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Veröffentlicht in:	The journal of physical chemistry. B 2006-08, Vol.110 (34), p.17167-17174
Hauptverfasser:	Critchley, Kevin, Zhang, Lixin, Fukushima, Hitoshi, Ishida, Masaya, Shimoda, Tatsuya, Bushby, Richard J, Evans, Stephen D
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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