Effect of high-energy electron-beam irradiation on the optical properties of ion-beam-sputtered silicon oxynitride thin films

Silicon oxynitride thin films are prepared by ion-beam sputtering, and the optical properties and surface chemical composition are studied by spectrophotometric and x-ray photoelectron spectroscopy, respectively. It is seen that the films sputtered by use of nitrogen alone as the sputtering species...

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Veröffentlicht in:	Applied Optics 2005-10, Vol.44 (29), p.6186-6192
Hauptverfasser:	Karanth, Shivaprasad, Shanbhogue, Ganesh H, Nagendra, C L
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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