Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods
The effects of repeating thickness periods on stress are studied in ZrO2/SiO2 multilayers deposited by electron-beam evaporation on BK7 glass and fused-silica substrates. The results show that the residual stress is compressive and decreases with an increase of the periods of repeating thickness in...
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Veröffentlicht in: | Optics letters 2005-08, Vol.30 (16), p.2119-2121 |
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Sprache: | eng |
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