Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods

Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods

The effects of repeating thickness periods on stress are studied in ZrO2/SiO2 multilayers deposited by electron-beam evaporation on BK7 glass and fused-silica substrates. The results show that the residual stress is compressive and decreases with an increase of the periods of repeating thickness in...

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Veröffentlicht in:Optics letters 2005-08, Vol.30 (16), p.2119-2121
Hauptverfasser: Shao, Shuying, Shao, Jianda, He, Hongbo, Fan, Zhengxiu
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Sprache:eng
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Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Mechanical and acoustical properties
Physical properties of thin films, nonelectronic
Physics
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
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container_title Optics letters
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creator Shao, Shuying
Shao, Jianda
He, Hongbo
Fan, Zhengxiu
description The effects of repeating thickness periods on stress are studied in ZrO2/SiO2 multilayers deposited by electron-beam evaporation on BK7 glass and fused-silica substrates. The results show that the residual stress is compressive and decreases with an increase of the periods of repeating thickness in the ZrO2/SiO2 multilayers. At the same time, the residual stress in multilayers deposited on BK7 glass is less than that of samples deposited on fused silica. The variation of the microstructure examined by x-ray diffraction shows that microscopic deformation does not correspond to macroscopic stress, which may be due to variation of the interface stress.
doi_str_mv 10.1364/OL.30.002119
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subjects Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Mechanical and acoustical properties
Physical properties of thin films, nonelectronic
Physics
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
title Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods
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