Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods
The effects of repeating thickness periods on stress are studied in ZrO2/SiO2 multilayers deposited by electron-beam evaporation on BK7 glass and fused-silica substrates. The results show that the residual stress is compressive and decreases with an increase of the periods of repeating thickness in...
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Veröffentlicht in: | Optics letters 2005-08, Vol.30 (16), p.2119-2121 |
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description | The effects of repeating thickness periods on stress are studied in ZrO2/SiO2 multilayers deposited by electron-beam evaporation on BK7 glass and fused-silica substrates. The results show that the residual stress is compressive and decreases with an increase of the periods of repeating thickness in the ZrO2/SiO2 multilayers. At the same time, the residual stress in multilayers deposited on BK7 glass is less than that of samples deposited on fused silica. The variation of the microstructure examined by x-ray diffraction shows that microscopic deformation does not correspond to macroscopic stress, which may be due to variation of the interface stress. |
doi_str_mv | 10.1364/OL.30.002119 |
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The results show that the residual stress is compressive and decreases with an increase of the periods of repeating thickness in the ZrO2/SiO2 multilayers. At the same time, the residual stress in multilayers deposited on BK7 glass is less than that of samples deposited on fused silica. The variation of the microstructure examined by x-ray diffraction shows that microscopic deformation does not correspond to macroscopic stress, which may be due to variation of the interface stress.</description><identifier>ISSN: 0146-9592</identifier><identifier>EISSN: 1539-4794</identifier><identifier>DOI: 10.1364/OL.30.002119</identifier><identifier>PMID: 16127929</identifier><identifier>CODEN: OPLEDP</identifier><language>eng</language><publisher>Washington, DC: Optical Society of America</publisher><subject>Condensed matter: structure, mechanical and thermal properties ; Exact sciences and technology ; Mechanical and acoustical properties ; Physical properties of thin films, nonelectronic ; Physics ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><ispartof>Optics letters, 2005-08, Vol.30 (16), p.2119-2121</ispartof><rights>2005 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>315,782,786,27931,27932</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=17005353$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/16127929$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Shao, Shuying</creatorcontrib><creatorcontrib>Shao, Jianda</creatorcontrib><creatorcontrib>He, Hongbo</creatorcontrib><creatorcontrib>Fan, Zhengxiu</creatorcontrib><title>Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods</title><title>Optics letters</title><addtitle>Opt Lett</addtitle><description>The effects of repeating thickness periods on stress are studied in ZrO2/SiO2 multilayers deposited by electron-beam evaporation on BK7 glass and fused-silica substrates. The results show that the residual stress is compressive and decreases with an increase of the periods of repeating thickness in the ZrO2/SiO2 multilayers. At the same time, the residual stress in multilayers deposited on BK7 glass is less than that of samples deposited on fused silica. The variation of the microstructure examined by x-ray diffraction shows that microscopic deformation does not correspond to macroscopic stress, which may be due to variation of the interface stress.</description><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Exact sciences and technology</subject><subject>Mechanical and acoustical properties</subject><subject>Physical properties of thin films, nonelectronic</subject><subject>Physics</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><issn>0146-9592</issn><issn>1539-4794</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2005</creationdate><recordtype>article</recordtype><recordid>eNpN0L1PwzAQBXALgWgpbMzIC2xpbV-cxCNCfEmVOhQWlspxLqppmgSfI9T_niKKYLrh_fT0dIxdSjGVkKWzxXwKYiqEktIcsbHUYJI0N-kxGwuZZonRRo3YGdG7ECLLAU7ZSGZS5UaZMdssY0Aiblvb7MgT72r-FhZqtvQLxbdDE31jdxiIV9h35CNWvGt55esaA7aR01BSDDYi8U8f1_-SuPZu036X9xh8V9E5O6ltQ3hxuBP2-nD_cveUzBePz3e386RXYGKC6X5mWWSQK6zK1NkSMmON1lAqJwqjbQ6uyFVVo6itcuBAWYWF0BYyhAom7Oantw_dx4AUV1tPDpvGttgNtMoKrVKVyz28OsCh3GK16oPf2rBb_b5nD64PwJKzTR1s6zz9uVwIDRrgCyhRdR8</recordid><startdate>20050815</startdate><enddate>20050815</enddate><creator>Shao, Shuying</creator><creator>Shao, Jianda</creator><creator>He, Hongbo</creator><creator>Fan, Zhengxiu</creator><general>Optical Society of America</general><scope>IQODW</scope><scope>NPM</scope><scope>7X8</scope></search><sort><creationdate>20050815</creationdate><title>Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods</title><author>Shao, Shuying ; Shao, Jianda ; He, Hongbo ; Fan, Zhengxiu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-p239t-e4067b86372edb4cab369a9553b2c0895a73c872dfe0fa2c3c32a2e805a36e3d3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2005</creationdate><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Exact sciences and technology</topic><topic>Mechanical and acoustical properties</topic><topic>Physical properties of thin films, nonelectronic</topic><topic>Physics</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Shao, Shuying</creatorcontrib><creatorcontrib>Shao, Jianda</creatorcontrib><creatorcontrib>He, Hongbo</creatorcontrib><creatorcontrib>Fan, Zhengxiu</creatorcontrib><collection>Pascal-Francis</collection><collection>PubMed</collection><collection>MEDLINE - Academic</collection><jtitle>Optics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Shao, Shuying</au><au>Shao, Jianda</au><au>He, Hongbo</au><au>Fan, Zhengxiu</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods</atitle><jtitle>Optics letters</jtitle><addtitle>Opt Lett</addtitle><date>2005-08-15</date><risdate>2005</risdate><volume>30</volume><issue>16</issue><spage>2119</spage><epage>2121</epage><pages>2119-2121</pages><issn>0146-9592</issn><eissn>1539-4794</eissn><coden>OPLEDP</coden><abstract>The effects of repeating thickness periods on stress are studied in ZrO2/SiO2 multilayers deposited by electron-beam evaporation on BK7 glass and fused-silica substrates. The results show that the residual stress is compressive and decreases with an increase of the periods of repeating thickness in the ZrO2/SiO2 multilayers. At the same time, the residual stress in multilayers deposited on BK7 glass is less than that of samples deposited on fused silica. The variation of the microstructure examined by x-ray diffraction shows that microscopic deformation does not correspond to macroscopic stress, which may be due to variation of the interface stress.</abstract><cop>Washington, DC</cop><pub>Optical Society of America</pub><pmid>16127929</pmid><doi>10.1364/OL.30.002119</doi><tpages>3</tpages></addata></record> |
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subjects | Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Mechanical and acoustical properties Physical properties of thin films, nonelectronic Physics Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) |
title | Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods |
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