Controlled Chemical Functionalization of Multiwalled Carbon Nanotubes by Kiloelectronvolt Argon Ion Treatment and Air Exposure

The chemical and morphological modifications of multiwalled carbon nanotubes (MWCNTs), by 2 keV Ar+ treatment, have been followed by field emission scanning (FESEM) and high-resolution transmission (HRTEM) electron microscopies and by X-ray photoelectron (XPS) and Raman spectroscopies. Morphological...

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Veröffentlicht in:Langmuir 2005-08, Vol.21 (18), p.8539-8545
Hauptverfasser: Yang, De-Quan, Rochette, Jean-Francois, Sacher, Edward
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Rochette, Jean-Francois
Sacher, Edward
description The chemical and morphological modifications of multiwalled carbon nanotubes (MWCNTs), by 2 keV Ar+ treatment, have been followed by field emission scanning (FESEM) and high-resolution transmission (HRTEM) electron microscopies and by X-ray photoelectron (XPS) and Raman spectroscopies. Morphological changes were followed, both in situ and on subsequent air exposure, and the data indicate that free radical defects, initially produced under low Ar+ treatment doses (∼1013 ions/cm2), act as the nuclei for the formation of localized asperities that form along the walls of the CNTs. Continued treatment results in their stublike elongation that continues with further treatment, forming extensions under heavy treatment doses. The chemical changes that occur, on reaction with air, reveal that the defects initially created are secondary C atoms, formed when a single bond breaks; further treatment breaks an additional bond to form primary C atoms; free radical fragments, lost when the third bond breaks, condense on the free radical defects to form the asperities. The extent of primary and secondary C atoms, and thus their functionalization on air exposure, may be controlled by the extent of treatment, offering a method for the controlled surface functionalization of CNTs by low-energy Ar+ treatment.
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title Controlled Chemical Functionalization of Multiwalled Carbon Nanotubes by Kiloelectronvolt Argon Ion Treatment and Air Exposure
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