Complementary Symmetry Silicon Nanowire Logic: Power-Efficient Inverters with Gain

Wired for high performance: The role of relative surface area in Si nanowire (NW) transistor (see image) performance was examined by comparing the performance of microwire (μW) field‐effect transistors (FETs) fabricated side‐by‐side with NW FETs. Both n‐ and p‐type NW FETs were found to be more sens...

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Veröffentlicht in:Small (Weinheim an der Bergstrasse, Germany) Germany), 2006-10, Vol.2 (10), p.1153-1158
Hauptverfasser: Wang, Dunwei, Sheriff, Bonnie A., Heath, James R.
Format: Artikel
Sprache:eng
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Zusammenfassung:Wired for high performance: The role of relative surface area in Si nanowire (NW) transistor (see image) performance was examined by comparing the performance of microwire (μW) field‐effect transistors (FETs) fabricated side‐by‐side with NW FETs. Both n‐ and p‐type NW FETs were found to be more sensitive to surface states than their μW counterparts; these results are utilized to produce NW n‐FETs with consistent performance.
ISSN:1613-6810
1613-6829
DOI:10.1002/smll.200600249