Omnidirectional reflector using nanoporous SiO2 as a low-refractive-index material
Triple-layer omnidirectional reflectors (ODRs) consisting of a semiconductor, a quarter-wavelength transparent dielectric layer, and a metal have high reflectivities for all angles of incidence. Internal ODRs (ambient material's refractive index n >> 1.0) are demonstrated that incorporate...
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Veröffentlicht in: | Optics letters 2005-06, Vol.30 (12), p.1518-1520 |
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creator | XI, J.-Q OJHA, Manas CHO, Woojin PLAWSKY, J. L GILL, W. N GESSMANN, Th SCHUBERT, E. F |
description | Triple-layer omnidirectional reflectors (ODRs) consisting of a semiconductor, a quarter-wavelength transparent dielectric layer, and a metal have high reflectivities for all angles of incidence. Internal ODRs (ambient material's refractive index n >> 1.0) are demonstrated that incorporate nanoporous SiO2, a low-refractive-index material (n = 1.23), as well as dense SiO2 (n = 1.46). GaP and Ag serve as the semiconductor and the metal layer, respectively. Reflectivity measurements, including angular dependence, are presented. Calculated angle-integrated TE and TM reflectivities for ODRs employing nanoporous SiO2 are R(int)/TE = 99.9% and R(int)/TM = 98.9%, respectively, indicating the high potential of the ODRs for low-loss waveguide structures. |
doi_str_mv | 10.1364/OL.30.001518 |
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N</creatorcontrib><creatorcontrib>GESSMANN, Th</creatorcontrib><creatorcontrib>SCHUBERT, E. F</creatorcontrib><title>Omnidirectional reflector using nanoporous SiO2 as a low-refractive-index material</title><title>Optics letters</title><addtitle>Opt Lett</addtitle><description>Triple-layer omnidirectional reflectors (ODRs) consisting of a semiconductor, a quarter-wavelength transparent dielectric layer, and a metal have high reflectivities for all angles of incidence. Internal ODRs (ambient material's refractive index n >> 1.0) are demonstrated that incorporate nanoporous SiO2, a low-refractive-index material (n = 1.23), as well as dense SiO2 (n = 1.46). GaP and Ag serve as the semiconductor and the metal layer, respectively. Reflectivity measurements, including angular dependence, are presented. Calculated angle-integrated TE and TM reflectivities for ODRs employing nanoporous SiO2 are R(int)/TE = 99.9% and R(int)/TM = 98.9%, respectively, indicating the high potential of the ODRs for low-loss waveguide structures.</description><subject>Applied sciences</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Fundamental areas of phenomenology (including applications)</subject><subject>Lenses, prisms and mirrors</subject><subject>Light-emitting devices</subject><subject>Optical elements, devices, and systems</subject><subject>Optics</subject><subject>Optoelectronic devices</subject><subject>Physics</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. 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F</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Omnidirectional reflector using nanoporous SiO2 as a low-refractive-index material</atitle><jtitle>Optics letters</jtitle><addtitle>Opt Lett</addtitle><date>2005-06-15</date><risdate>2005</risdate><volume>30</volume><issue>12</issue><spage>1518</spage><epage>1520</epage><pages>1518-1520</pages><issn>0146-9592</issn><eissn>1539-4794</eissn><coden>OPLEDP</coden><abstract>Triple-layer omnidirectional reflectors (ODRs) consisting of a semiconductor, a quarter-wavelength transparent dielectric layer, and a metal have high reflectivities for all angles of incidence. Internal ODRs (ambient material's refractive index n >> 1.0) are demonstrated that incorporate nanoporous SiO2, a low-refractive-index material (n = 1.23), as well as dense SiO2 (n = 1.46). GaP and Ag serve as the semiconductor and the metal layer, respectively. Reflectivity measurements, including angular dependence, are presented. Calculated angle-integrated TE and TM reflectivities for ODRs employing nanoporous SiO2 are R(int)/TE = 99.9% and R(int)/TM = 98.9%, respectively, indicating the high potential of the ODRs for low-loss waveguide structures.</abstract><cop>Washington, DC</cop><pub>Optical Society of America</pub><pmid>16007793</pmid><doi>10.1364/OL.30.001518</doi><tpages>3</tpages></addata></record> |
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subjects | Applied sciences Electronics Exact sciences and technology Fundamental areas of phenomenology (including applications) Lenses, prisms and mirrors Light-emitting devices Optical elements, devices, and systems Optics Optoelectronic devices Physics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices |
title | Omnidirectional reflector using nanoporous SiO2 as a low-refractive-index material |
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