Tungsten Allylimido Complexes Cl4(RCN)W(NC3H5) as Single-Source CVD Precursors for WNxCy Thin Films. Correlation of Precursor Fragmentation to Film Properties
A mixture of the tungsten allylimido complexes Cl(4)(RCN)W(NC(3)H(5)) (3a, R = CH(3) and 3b, R = Ph) was tested as a single-source precursor for growth of tungsten nitride (WN(x)) or carbonitride (WN(x)C(y)) thin films. Films deposited from 3a,b below 550 degrees C contained amorphous beta-WN(x)C(y)...
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Veröffentlicht in: | Journal of the American Chemical Society 2005-06, Vol.127 (21), p.7825-7833 |
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Sprache: | eng |
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Zusammenfassung: | A mixture of the tungsten allylimido complexes Cl(4)(RCN)W(NC(3)H(5)) (3a, R = CH(3) and 3b, R = Ph) was tested as a single-source precursor for growth of tungsten nitride (WN(x)) or carbonitride (WN(x)C(y)) thin films. Films deposited from 3a,b below 550 degrees C contained amorphous beta-WN(x)C(y), while those deposited at higher temperatures were polycrystalline. Film growth rates from 3a,b ranged from 5 to 10 A/min over a temperature range of 450-650 degrees C, and the apparent activation energy for film growth was 0.15 eV. A plot of the E(a) values for deposition from Cl(4)(RCN)W(NR') [R' = Ph, (i)Pr, allyl] against the N-C imido bond strengths for the analogous amines R'NH(2) is linear, implicating cleavage of the N-C bond as the rate-determining step in film growth. The correlation of mass spectral fragmentation patterns for Cl(4)(RCN)W(NR') with film properties such as nitrogen content supports the significance of facile N-C bond cleavage in film growth. |
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ISSN: | 0002-7863 1520-5126 |
DOI: | 10.1021/ja043799d |