Electrochemical reactions at a porphyrin-copper interface
The structure and reactivity of a Cu(100) single crystal electrode surface covered with free base meso-tetra (N-methyl-4-pyridinium) porphyrin (abbreviated as H(2)TMPyP) as a function of electrode potential have been investigated with cyclic voltammetry (CV), electrochemical scanning tunneling micro...
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Veröffentlicht in: | Physical chemistry chemical physics : PCCP 2009-01, Vol.11 (26), p.5422-5430 |
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creator | HAI, Nguyen T. M FURUKAWA, Shuhei VOSCH, Tom DE FEYTER, Steven BROEKMANN, Peter WANDELT, Klaus |
description | The structure and reactivity of a Cu(100) single crystal electrode surface covered with free base meso-tetra (N-methyl-4-pyridinium) porphyrin (abbreviated as H(2)TMPyP) as a function of electrode potential have been investigated with cyclic voltammetry (CV), electrochemical scanning tunneling microscopy (ECSTM), and UV-Vis and Raman spectroscopy. The well-ordered self-assembled layer of the porphyrin is consistent with the adsorption of the reduced porphyrin species after the first two-electron reduction step. The copper dissolution reaction in the presence of the stable self-assembled porphyrin layer starts at step edges on both upper and lower terraces and coincides with the preferential oxidation of reduced porphyrin species at step sites. The dissolved copper cations are incorporated into the free base porphyrin molecules leading to the formation of CuTMPyP. As a consequence this new species accumulates in the solution with time and a copper redeposition in the cathodic potential scan is lacking. |
doi_str_mv | 10.1039/b807075j |
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M ; FURUKAWA, Shuhei ; VOSCH, Tom ; DE FEYTER, Steven ; BROEKMANN, Peter ; WANDELT, Klaus</creator><creatorcontrib>HAI, Nguyen T. M ; FURUKAWA, Shuhei ; VOSCH, Tom ; DE FEYTER, Steven ; BROEKMANN, Peter ; WANDELT, Klaus</creatorcontrib><description>The structure and reactivity of a Cu(100) single crystal electrode surface covered with free base meso-tetra (N-methyl-4-pyridinium) porphyrin (abbreviated as H(2)TMPyP) as a function of electrode potential have been investigated with cyclic voltammetry (CV), electrochemical scanning tunneling microscopy (ECSTM), and UV-Vis and Raman spectroscopy. The well-ordered self-assembled layer of the porphyrin is consistent with the adsorption of the reduced porphyrin species after the first two-electron reduction step. The copper dissolution reaction in the presence of the stable self-assembled porphyrin layer starts at step edges on both upper and lower terraces and coincides with the preferential oxidation of reduced porphyrin species at step sites. The dissolved copper cations are incorporated into the free base porphyrin molecules leading to the formation of CuTMPyP. As a consequence this new species accumulates in the solution with time and a copper redeposition in the cathodic potential scan is lacking.</description><identifier>ISSN: 1463-9076</identifier><identifier>EISSN: 1463-9084</identifier><identifier>DOI: 10.1039/b807075j</identifier><identifier>PMID: 19551211</identifier><language>eng</language><publisher>Cambridge: Royal Society of Chemistry</publisher><subject>Chemistry ; Copper - chemistry ; Electrochemistry ; Exact sciences and technology ; General and physical chemistry ; Microscopy, Atomic Force ; Molecular Structure ; Porphyrins - chemistry ; Spectrum Analysis, Raman ; Surface physical chemistry ; Surface Properties</subject><ispartof>Physical chemistry chemical physics : PCCP, 2009-01, Vol.11 (26), p.5422-5430</ispartof><rights>2009 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c311t-c2e0f72a30a70e8bac38eaaaa55f0506521c066d24df304a1fce1fc4a62ba4f3</citedby><cites>FETCH-LOGICAL-c311t-c2e0f72a30a70e8bac38eaaaa55f0506521c066d24df304a1fce1fc4a62ba4f3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=21708311$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/19551211$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>HAI, Nguyen T. M</creatorcontrib><creatorcontrib>FURUKAWA, Shuhei</creatorcontrib><creatorcontrib>VOSCH, Tom</creatorcontrib><creatorcontrib>DE FEYTER, Steven</creatorcontrib><creatorcontrib>BROEKMANN, Peter</creatorcontrib><creatorcontrib>WANDELT, Klaus</creatorcontrib><title>Electrochemical reactions at a porphyrin-copper interface</title><title>Physical chemistry chemical physics : PCCP</title><addtitle>Phys Chem Chem Phys</addtitle><description>The structure and reactivity of a Cu(100) single crystal electrode surface covered with free base meso-tetra (N-methyl-4-pyridinium) porphyrin (abbreviated as H(2)TMPyP) as a function of electrode potential have been investigated with cyclic voltammetry (CV), electrochemical scanning tunneling microscopy (ECSTM), and UV-Vis and Raman spectroscopy. The well-ordered self-assembled layer of the porphyrin is consistent with the adsorption of the reduced porphyrin species after the first two-electron reduction step. The copper dissolution reaction in the presence of the stable self-assembled porphyrin layer starts at step edges on both upper and lower terraces and coincides with the preferential oxidation of reduced porphyrin species at step sites. The dissolved copper cations are incorporated into the free base porphyrin molecules leading to the formation of CuTMPyP. As a consequence this new species accumulates in the solution with time and a copper redeposition in the cathodic potential scan is lacking.</description><subject>Chemistry</subject><subject>Copper - chemistry</subject><subject>Electrochemistry</subject><subject>Exact sciences and technology</subject><subject>General and physical chemistry</subject><subject>Microscopy, Atomic Force</subject><subject>Molecular Structure</subject><subject>Porphyrins - chemistry</subject><subject>Spectrum Analysis, Raman</subject><subject>Surface physical chemistry</subject><subject>Surface Properties</subject><issn>1463-9076</issn><issn>1463-9084</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><sourceid>EIF</sourceid><recordid>eNpFkE1Lw0AQhhdRrFbBXyC5KF6iM9nsJjlKqR9Q8NJ7mGxnaUq-3E0P_feuNNaBYd7DwwvzCHGH8Iwgi5cqhwwytTsTV5hqGReQp-ennOmZuPZ-BwCoUF6KGRZKYYJ4JYplw2Z0vdlyWxtqIsdkxrrvfERjRNHQu2F7cHUXm34Y2EV1N7KzZPhGXFhqPN9Ody7Wb8v14iNefb1_Ll5XsZGIY2wSBpslJIEy4LwiI3OmMEpZUKBVgga03iTpxkpICa3hsCnppKLUyrl4PNYOrv_esx_LtvaGm4Y67ve-1FmKhdZ5AJ-OoHG9945tObi6JXcoEcpfS-WfpYDeT537quXNPzhpCcDDBJAPUqyjztT-xCWYQR6-kz9b-G8W</recordid><startdate>20090101</startdate><enddate>20090101</enddate><creator>HAI, Nguyen T. 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M</creatorcontrib><creatorcontrib>FURUKAWA, Shuhei</creatorcontrib><creatorcontrib>VOSCH, Tom</creatorcontrib><creatorcontrib>DE FEYTER, Steven</creatorcontrib><creatorcontrib>BROEKMANN, Peter</creatorcontrib><creatorcontrib>WANDELT, Klaus</creatorcontrib><collection>Pascal-Francis</collection><collection>Medline</collection><collection>MEDLINE</collection><collection>MEDLINE (Ovid)</collection><collection>MEDLINE</collection><collection>MEDLINE</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><jtitle>Physical chemistry chemical physics : PCCP</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>HAI, Nguyen T. M</au><au>FURUKAWA, Shuhei</au><au>VOSCH, Tom</au><au>DE FEYTER, Steven</au><au>BROEKMANN, Peter</au><au>WANDELT, Klaus</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Electrochemical reactions at a porphyrin-copper interface</atitle><jtitle>Physical chemistry chemical physics : PCCP</jtitle><addtitle>Phys Chem Chem Phys</addtitle><date>2009-01-01</date><risdate>2009</risdate><volume>11</volume><issue>26</issue><spage>5422</spage><epage>5430</epage><pages>5422-5430</pages><issn>1463-9076</issn><eissn>1463-9084</eissn><abstract>The structure and reactivity of a Cu(100) single crystal electrode surface covered with free base meso-tetra (N-methyl-4-pyridinium) porphyrin (abbreviated as H(2)TMPyP) as a function of electrode potential have been investigated with cyclic voltammetry (CV), electrochemical scanning tunneling microscopy (ECSTM), and UV-Vis and Raman spectroscopy. The well-ordered self-assembled layer of the porphyrin is consistent with the adsorption of the reduced porphyrin species after the first two-electron reduction step. The copper dissolution reaction in the presence of the stable self-assembled porphyrin layer starts at step edges on both upper and lower terraces and coincides with the preferential oxidation of reduced porphyrin species at step sites. The dissolved copper cations are incorporated into the free base porphyrin molecules leading to the formation of CuTMPyP. As a consequence this new species accumulates in the solution with time and a copper redeposition in the cathodic potential scan is lacking.</abstract><cop>Cambridge</cop><pub>Royal Society of Chemistry</pub><pmid>19551211</pmid><doi>10.1039/b807075j</doi><tpages>9</tpages></addata></record> |
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subjects | Chemistry Copper - chemistry Electrochemistry Exact sciences and technology General and physical chemistry Microscopy, Atomic Force Molecular Structure Porphyrins - chemistry Spectrum Analysis, Raman Surface physical chemistry Surface Properties |
title | Electrochemical reactions at a porphyrin-copper interface |
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